High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …

In plasma-based deposition processing, the importance of low-energy ion bombardment
during thin film growth can hardly be exaggerated. Ion bombardment is an important …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

We demonstrate the evolution of the electron, energy distribution and the plasma
parameters in a high-density plasma in a pulsed magnetron discharge. The high-density …

Efficient deposition of high-quality coatings often requires controlled application of excited or
ionized particles. These particles are either condensing (film-forming) or assisting by …

The effect of the high pulse current and the duty cycle on the deposition rate in high power
pulsed magnetron sputtering (HPPMS) is investigated. Using a Cr target and the same …

High power pulsed magnetron sputtering (HPPMS) is used to deposit CrN films without
external heating at different peak target currents, while the average current is kept constant …

Ta thin films were grown on Si substrates at different inclination angles with respect to the
sputter source using high power impulse magnetron sputtering (HIPIMS), an ionized …

Plasma-based physical vapor deposition (PVD) methods have found widespread use in
various industrial applications. In plasma-based PVD processes, the deposition species are …