Apollo Next Generation Sample Analysis (ANGSA): An Apollo participating scientist program to prepare the lunar sample community for Artemis
As a first step in preparing for the return of samples from the Moon by the Artemis Program,
NASA initiated the Apollo Next Generation Sample Analysis Program (ANGSA). ANGSA was …
NASA initiated the Apollo Next Generation Sample Analysis Program (ANGSA). ANGSA was …
Cryogenic etching of silicon compounds using a CHF3 based plasma
R Dussart, R Ettouri, J Nos, G Antoun… - Journal of Applied …, 2023 - pubs.aip.org
Cryogenic etching of a-Si, SiO 2, and Si 3 N 4 materials by CHF 3/Ar inductively coupled
plasma is investigated in a range of temperature from− 140 to+ 20 C. Samples of the three …
plasma is investigated in a range of temperature from− 140 to+ 20 C. Samples of the three …
Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O2 and Ar plasmas
G Antoun, T Tillocher, A Girard, P Lefaucheux… - Journal of Vacuum …, 2022 - pubs.aip.org
This article first presents quasi-in situ XPS measurements on Si 3 N 4 and a-Si samples after
exposure to an SiF 4/O 2 plasma at different cryogenic temperatures. A different behavior is …
exposure to an SiF 4/O 2 plasma at different cryogenic temperatures. A different behavior is …
Stabilizing the Solid Electrolyte Interphase of SiOx Negative Electrodes: The Role of Fluoroethylene Carbonate in Enhancing Electrochemical Performance
This study examined the role of fluoroethylene carbonate (FEC) in stabilizing the solid
electrolyte interphase (SEI) and enhancing the electrochemical performance of SiOx-based …
electrolyte interphase (SEI) and enhancing the electrochemical performance of SiOx-based …
Devitrified silica minerals glass of tanohataite (LiMn2Si3O8F) mineral as anode material for lithium-ion batteries
MG Fayed, AEA Ghany, RS El-Tawil, AM Hashem… - Ceramics …, 2025 - Elsevier
Devitrified silica minerals glass was obtained from stoichiometric tanohataite (LiMn 2 Si 3 O
8 F) mineral prepared by melt quench route. Low-quartz and cristobalite (∼ 19.5%) were …
8 F) mineral prepared by melt quench route. Low-quartz and cristobalite (∼ 19.5%) were …
[HTML][HTML] Future of plasma etching for microelectronics: Challenges and opportunities
Plasma etching is an essential semiconductor manufacturing technology required to enable
the current microelectronics industry. Along with lithographic patterning, thin-film formation …
the current microelectronics industry. Along with lithographic patterning, thin-film formation …
Passivation mechanisms involved in cryo-etching processes
R Dussart, T Tillocher, P Lefaucheux, J Nos… - … 2023/ICPLANTS 2023, 2023 - hal.science
Cryoetching of silicon was introduced about 35 years ago by a Japanese team. Anisotropic
etching was obtained using a plasma of SF6 interacting with a masked silicon wafer cooled …
etching was obtained using a plasma of SF6 interacting with a masked silicon wafer cooled …