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Cyclic, cryogenic, highly anisotropic plasma etching of silicon using SF6∕ O2
AF Isakovic, K Evans-Lutterodt, D Elliott… - Journal of Vacuum …, 2008 - pubs.aip.org
The authors report on the development and characterization of a plasma etching method
that utilizes process steps common to both the well-known Bosch and the cryogenic deep …
that utilizes process steps common to both the well-known Bosch and the cryogenic deep …
Fabrication of nanobeam using Focused ion beam (FIB) and KOH etching
H Cheng, H Yang, Y Wang - 2009 4th IEEE International …, 2009 - ieeexplore.ieee.org
A new process method is developed to fabricate beam into nanometer scale in width.
Assisted by Focused ion beam (FIB), one 122 nm silicon nanobeam is obtained on (110) …
Assisted by Focused ion beam (FIB), one 122 nm silicon nanobeam is obtained on (110) …
Fabrication of Thick Insulating Membrane Embedded in Si Substrate
V Ovchinnikov, Y Liu - 2010 Fourth International Conference …, 2010 - ieeexplore.ieee.org
The present paper is devoted to the description of a fabrication process of thick (tens of
micrometers) insulating SiO 2 membrane embedded in a c-Si substrate. The membrane …
micrometers) insulating SiO 2 membrane embedded in a c-Si substrate. The membrane …
[CITACE][C] 一种 FIB 刻蚀结合 KOH 腐蚀的制造纳米梁的新方法
成海涛， 杨恒， 王跃林 - 功能材料与器件学报, 2010