Ion-beam-induced amorphization and recrystallization in silicon
Ion-beam-induced amorphization in Si has attracted significant interest since the beginning
of the use of ion implantation for the fabrication of Si devices. A number of theoretical …
of the use of ion implantation for the fabrication of Si devices. A number of theoretical …
Ion-beam processing of silicon at keV energies: A molecular-dynamics study
We discuss molecular-dynamics simulations of ion damage in silicon, with emphasis on the
effects of ion mass and energy. We employ the Stillinger-Weber potential for silicon, suitably …
effects of ion mass and energy. We employ the Stillinger-Weber potential for silicon, suitably …
Point Defect Dynamics and the Oxidation‐Induced Stacking‐Fault Ring in Czochralski‐Grown Silicon Crystals
ABSTRACT A model is presented and analyzed for the dynamics of intrinsic point defects,
vacancies, and self-interstitials, in single-crystal silicon. Computations and asymptotic …
vacancies, and self-interstitials, in single-crystal silicon. Computations and asymptotic …
The dependence of bulk defects on the axial temperature gradient of silicon crystals during Czochralski growth
W Von Ammon, E Dornberger, H Oelkrug… - Journal of crystal …, 1995 - Elsevier
4 ″, 6 ″and 8 ″Cz crystals were grown with different heat shields which protect the
growing crystals against radiation emitted from the melt surface and hot graphite parts …
growing crystals against radiation emitted from the melt surface and hot graphite parts …
The Dependence of Ring‐Like Distributed Stacking Faults on the Axial Temperature Gradient of Growing Czochralski Silicon Crystals
E Dornberger, W von Ammon - Journal of the Electrochemical …, 1996 - iopscience.iop.org
The ring diameter of ring-like distributed oxidation induced stacking faults (OSF) in
Czochralski grown silicon crystals has been investigated as a function of pull rate and the …
Czochralski grown silicon crystals has been investigated as a function of pull rate and the …
Mathematics in chemical engineering: A 50 year introspection
D Ramkrishna, NR Amundson - AIChE journal, 2004 - Wiley Online Library
A review is made of the role of mathematics in the field of chemical engineering in the latter
half of the twentieth century. The beginning of this era was marked by the concerted effort of …
half of the twentieth century. The beginning of this era was marked by the concerted effort of …
Intrinsic point defect behavior in silicon crystals during growth from the melt: A model derived from experimental results
T Abe, T Takahashi - Journal of Crystal Growth, 2011 - Elsevier
During the growth of float-zoning (FZ) and Czochralski (CZ) Si crystals, the temperature
distributions from the growth interface were measured using a two-color infrared …
distributions from the growth interface were measured using a two-color infrared …
Recent contributions of statistical mechanics in chemical engineering
MW Deem - AIChE journal, 1998 - Wiley Online Library
Some of the recent advances that have been made by chemical engineers in the field of
statistical mechanics, as well as some of the new products and processes that have resulted …
statistical mechanics, as well as some of the new products and processes that have resulted …
Formation process of grown-in defects in Czochralski grown silicon crystals
K Nakamura, T Saishoji, T Kubota, T Iida… - Journal of Crystal …, 1997 - Elsevier
We have determined the set of the diffusion coefficients (Dv: vacancies, Di: self-interstitials)
and equilibrium concentrations (Ceqv: vacancies, Ceqi: self-interstitials) of point defects …
and equilibrium concentrations (Ceqv: vacancies, Ceqi: self-interstitials) of point defects …
Influence of oxygen and nitrogen on point defect aggregation in silicon single crystals
WV Ammon, P Dreier, W Hensel, U Lambert… - Materials Science and …, 1996 - Elsevier
Oxygen-and nitrogen-doped floating zone (FZ) crystals were investigated with regard to
radial oxygen precipitation, D-defect formation and gate oxide integrity (GOI) behavior as a …
radial oxygen precipitation, D-defect formation and gate oxide integrity (GOI) behavior as a …