Ion beams in materials processing and analysis

B Schmidt, K Wetzig - 2012 - books.google.com
A comprehensive review of ion beam application in modern materials research is provided,
including the basics of ion beam physics and technology. The physics of ion-solid …

Si and Ge nanocrystals for future memory devices

C Bonafos, M Carrada, G Benassayag… - Materials Science in …, 2012 - Elsevier
An attractive alternative for extending the scaling of Flash-type memories is to replace the
conventional floating gate (a poly-Si layer) by laterally isolated floating nodes in the form of …

Nano-composite MOx materials for NVMs

C Bonafos, L Khomenkhova, F Gourbilleau… - Metal Oxides for Non …, 2022 - Elsevier
In this chapter, we will present a digest of the main materials science aspects of the
controlled fabrication of 2D arrays of semiconducting (Si, Ge) nanocrystals (NCs) in metal …

GIP-CNFM: a French education network moving from microelectronics to nanotechnologies CNFM: National coordination for education in microelectronics and …

O Bonnaud, P Gentil, A Bsiesy… - 2011 IEEE Global …, 2011 - ieeexplore.ieee.org
Microelectronics high education in France is organized through a network composed of
twelve centers, six of them having clean-rooms and technological facilities. During the year …

Semiconductor nanocrystals in dielectrics: optoelectronic and memory applications of related silicon-based MIS devices

ZJ Horváth - Current Applied Physics, 2006 - Elsevier
Semiconductor nanocrystals in dielectrics: Optoelectronic and memory applications of
related silicon-based MIS devices - ScienceDirect Skip to main contentSkip to article …

Si nanocrystals by ultra-low-energy ion beam-synthesis for non-volatile memory applications

C Bonafos, H Coffin, S Schamm, N Cherkashin… - Solid-State …, 2005 - Elsevier
In this work, we show how to manipulate two-dimensional arrays of Si NCs in thin (⩽ 10nm)
SiO2 layers by ultra-low-energy (⩽ 1keV) ion implantation and subsequent thermal …

Simple method for the fabrication of a high dielectric constant metal-oxide-semiconductor capacitor embedded with Pt nanoparticles

C Sargentis, K Giannakopoulos, A Travlos… - Applied physics …, 2006 - pubs.aip.org
We present a simple method for the fabrication of Pt nanoparticles embedded in a high-k
dielectric. The nanoparticles are formed during the first deposition stages of a thin Pt layer …

From continuous to quantized charging response of silicon nanocrystals obtained by ultra-low energy ion implantation

M Shalchian, J Grisolia, GB Assayag, H Coffin… - Solid-state …, 2005 - Elsevier
In this paper, we present a study on the contribution of silicon nanocrystals to the electrical
transport characteristics of large (100μm× 100μm) and small (100nm× 100nm) metal-oxide …

Nanocrystal non-volatile memory devices

ZJ Horváth, P Basa - Materials Science Forum, 2009 - Trans Tech Publ
Nanocrystal Non-Volatile Memory Devices Page 1 Nanocrystal non-volatile memory devices Zs.
J. Horváth a and P. Basa b Hungarian Academy of Sciences, Research Institute for Technical …

Room-temperature quantum effect in silicon nanoparticles obtained by low-energy ion implantation and embedded in a nanometer scale capacitor

M Shalchian, J Grisolia, GB Assayag, H Coffin… - Applied Physics …, 2005 - pubs.aip.org
In this article, we present the room-temperature current-voltage characteristics of a
nanometer scale (100× 100 nm 2) metal-oxide-semiconductor capacitor containing few (less …