Ion energy control by RF pulse shape
A Marakhtanov, Z Chen, JP Holland - US Patent 9,536,749, 2017 - Google Patents
A method for slope control of ion energy is described. The method includes receiving a
setting indicating that an etch operation is to be performed using a radio frequency (RF) …
setting indicating that an etch operation is to be performed using a radio frequency (RF) …
Soft pulsing
JC Valcore - US Patent 10,157,729, 2018 - Google Patents
Abstract Systems and methods for soft pulsing are described. One of the systems includes a
master radiofrequency (RF) generator for generating a first portion of a master RF signal …
master radiofrequency (RF) generator for generating a first portion of a master RF signal …
Methods and apparatus for synchronizing RF pulses in a plasma processing system
JC Valcore, BJ Lyndaker, H Singh - US Patent 9,368,329, 2016 - Google Patents
(56) References Cited 2004/0087047 A1 5/2004 Jaiswal et al. 2004/O107906 A1 6/2004
Collins et al. US PATENT DOCUMENTS 2004/O135590 A1 7/2004 Quon 2004/0222184 …
Collins et al. US PATENT DOCUMENTS 2004/O135590 A1 7/2004 Quon 2004/0222184 …
Plasma processing method
N Yamada, T Tachikawa, K Nagami… - US Patent …, 2018 - Google Patents
A plasma processing method for performing a plasma process on a substrate in a plasma
processing apparatus is provided. The plasma processing method comprises: a sampling …
processing apparatus is provided. The plasma processing method comprises: a sampling …
Sub-pulsing during a state
JC Valcore, H Singh, BJ Lyndaker - US Patent 9,390,893, 2016 - Google Patents
A method for achieving sub-pulsing during a state is described. The method includes
receiving a clock signal from a clock source, the clock signal having two states and …
receiving a clock signal from a clock source, the clock signal having two states and …
Plasma processing apparatus
N Yamada, T Tachikawa, K Nagami… - US Patent …, 2017 - Google Patents
A plasma processing apparatus performs a stable and accurate matching operation with
high reproducibility in a power modulation process of modulating of a high frequency power …
high reproducibility in a power modulation process of modulating of a high frequency power …
Using modeling to determine ion energy associated with a plasma system
JC Valcore, BJ Lyndaker - US Patent 9,842,725, 2017 - Google Patents
Abstract Systems and methods for determining ion energy are described. One of the
methods includes detecting output of a generator to identify a generator output complex …
methods includes detecting output of a generator to identify a generator output complex …
Plasma processing apparatus and plasma processing method
K Nagami, N Yamada, T Gondai, K Yoshida - US Patent 9,875,881, 2018 - Google Patents
At a first timing after mounting a semiconductor wafer W on an electrostatic chuck 38, a
susceptor 12 is switched from an electrically grounded state into a floated state. From a …
susceptor 12 is switched from an electrically grounded state into a floated state. From a …
Automatic ESC bias compensation when using pulsed DC bias
J Rogers, CUI Linying, L Dorf - US Patent 11,476,145, 2022 - Google Patents
Disclosed herein is a system for pulsed DC biasing and clam** a substrate. The system
can include a plasma chamber having an ESC for supporting a substrate. An electrode is …
can include a plasma chamber having an ESC for supporting a substrate. An electrode is …
Determining a value of a variable on an RF transmission model
JC Valcore, BJ Lyndaker - US Patent 9,320,126, 2016 - Google Patents
Systems and methods for determining a value of a variable on a radio frequency (RF)
transmission model are described. One of the methods includes identifying a complex …
transmission model are described. One of the methods includes identifying a complex …