Controlling ambipolarity with improved RF performance by drain/gate work function engineering and using high dielectric material in electrically doped TFET …

S Yadav, D Sharma, D Soni, M Aslam - Journal of Computational …, 2017 - Springer
This article proposes a novel device structure of electrically doped tunnel FET with
drain/gate work function engineering by using hetero-dielectric material for the suppression …

Impact of gate material engineering on ED‐TFET for improving DC/analogue‐RF/linearity performances

BV Chandan, S Dasari, K Nigam, S Yadav… - Micro & Nano …, 2018 - Wiley Online Library
To avoid the fabrication complexity and cost of nanoscale devices, a dual metal gate (DMG)
in polarity controlled electrically doped tunnel field‐effect transistor (ED‐TFET) has been …

A fair comparison of the performance of charge plasma and electrostatic tunnel FETs for low-power high-frequency applications

BV Chandan, K Nigam, C Rajan, D Sharma - Journal of Computational …, 2019 - Springer
A comparative investigation has been carried out on the charge plasma tunnel field-effect
transistor (CP-TFET) and electrically doped TFET (ED-TFET). Both device structures are …

Temperature sensitivity analysis on analog/RF and linearity metrics of electrically doped tunnel FET

BV Chandan, K Nigam, S Pandey… - 2017 Conference on …, 2017 - ieeexplore.ieee.org
In this paper, we have deal with the impact of temperature based on polarity controlled
concept. Therefore, temperature sensitivity on the electrically doped tunnel FET (ED-TFET) …