Ferroelectric field effect transistors (FeFETs): advancements, challenges and exciting prospects for next generation non-volatile memory (NVM) applications

J Ajayan, P Mohankumar, D Nirmal… - Materials Today …, 2023 - Elsevier
Data intensive applications such as AI (Artificial Intelligence) and IoT (Internet of Things)
demand high performance and highly reliable non-volatile memories (NVM). FeFET offers …

Reliability of TCAD study for HfO2-doped Negative capacitance FinFET with different Material-Specific dopants

RK Jaisawal, S Rathore, PN Kondekar, N Bagga - Solid-State Electronics, 2023 - Elsevier
Attaining the ferroelectric (FE) polarization in a thin HfO 2 layer using a specific dopant is a
widely adopted way to realize Negative Capacitance (NC) FET. In a general TCAD …

Negative capacitance FET based energy efficient and DPA attack resilient ultra-light weight block cipher design

RC Bheemana, A Japa, S sankar Yellampalli… - Microelectronics …, 2023 - Elsevier
Energy-efficient and secure cipher design for resource constrained IoT applications is a
pressing challenge with CMOS technology scaling and increased hardware attacks. This …

Analog/RF and linearity performance assessment of a negative capacitance FinFET using high threshold voltage techniques

RK Jaisawal, S Rathore, PN Kondekar… - IEEE Transactions on …, 2023 - ieeexplore.ieee.org
The continued exploration of the ferroelectric-based negative capacitance field effect
transistor (NCFET) for energy-efficient and higher current drivability merits has called for an …

Demonstration of improved short channel performance metrics for ferroelectric concentric negative capacitance FinFET

V Chauhan, DP Samajdar, N Bagga - Silicon, 2023 - Springer
Using well-calibrated TCAD models, we have exhibited the application of both Dielectric
(DE) and Ferroelectric (FE) materials as spacers in Negative Capacitance (NC) FinFET. We …

Impact of random spatial fluctuation in non-uniform crystalline phases on multidomain MFIM capacitor and negative capacitance FDSOI

N Chauhan, C Garg, K Ni, AK Behera… - 2022 IEEE …, 2022 - ieeexplore.ieee.org
In this work, we explain the phenomena of ferroelectricity modulation in the ferroelectric (FE)
layer due to the residing dielectric (DE) phase. This work also demonstrates the impact of …

Investigation on performance degradation due to induced interface trapped charges on HSO based FDSOI NCFET and sustaining it through back-gate bias

RR Shaik, KP Pradhan - Semiconductor Science and Technology, 2022 - iopscience.iop.org
In this article, a variant of doped HfO 2 based ferroelectric capacitor ie silicon doped HfO 2
(hafnia-silica/HSO) is investigated for analytical feasibility and viability for negative …

Noise Analysis in FinFET-based Analog Circuit with Technology Scaling

M Patil, RK Jaisawal, S Banchhor… - 2023 IEEE Devices …, 2023 - ieeexplore.ieee.org
Noise in any circuit determines the minimum acceptable signal level that can process
without compromising its functionality. In field-effect transistors (FETs), mainly two types of …

Design and security evaluation of negative capacitance FETs for energy efficient and DPA attack resilient PRSENT-80 block cipher design at scaled VDD

RC Bheemana, PK Rao, A Japa… - 27th International …, 2023 - ieeexplore.ieee.org
Negative capacitance Field Effect Transistor (NCFET) is a promising CMOS compatible
technology that exhibits relatively lower subthreshold swing (SS) and higher ON current at …

Unveiling the Impact of Interface Traps Induced on Negative Capacitance Nanosheet FET: A Reliability Perspective

A Gupta, G Bajpai, N Bagga, S Banchhor… - … Symposium on VLSI …, 2022 - Springer
Reliability and yield are major concerns of nano-scaled devices. Bias temperature instability
(BTI) has always been one of the major reliability issue for the semiconductor transistors. BTI …