Two classic radio-frequency (RF) plasmas, ie, the capacitively and the inductively coupled
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …

Particle based simulations are indispensable tools for numerical studies of charged particle
swarms and low-temperature plasma sources. The main advantage of such approaches is …

Power absorption by electrons from the space-and time-dependent electric field represents
the basic sustaining mechanism of all radio-frequency driven plasmas. This complex …

A non-equilibrium electronegative plasma serves as the reactive source for semiconductor
dry processing as an advanced technology. This paper reviews the current knowledge about …

Self-organized spatial structures in the light emission from the ion-ion capacitive rf plasma of
a strongly electronegative gas (CF 4) are observed experimentally for the first time. Their …

We report the first experimental observation of nonlinear standing waves excited by plasma-
series-resonance-enhanced harmonics in low pressure, very high frequency, parallel plate …

The power absorption dynamics of electrons and the electrical asymmetry effect in
capacitive radio-frequency plasmas operated in CF 4 and driven by tailored voltage …

We use the one-dimensional object-oriented particle-in-cell Monte Carlo collision code
oopd1 to explore the charged particle densities, the electronegativity, the electron energy …

The electrical asymmetry effect (EAE) enables separate control of the ion flux and the mean
ion energy in capacitively coupled plasmas (CCP). While a variety of plasma processing …

The steady-state criterion for plasma numerical simulations can be determined by the
particle balance relation. In this study, we utilized a one-dimensional (1D) particle-in …