MEMS inductor fabrication and emerging applications in power electronics and neurotechnologies

HT Le, RI Haque, Z Ouyang, SW Lee, SI Fried… - Microsystems & …, 2021 - nature.com
MEMS inductors are used in a wide range of applications in micro-and nanotechnology,
including RF MEMS, sensors, power electronics, and Bio-MEMS. Fabrication technologies …

3-D integration and through-silicon vias in MEMS and microsensors

Z Wang - Journal of Microelectromechanical Systems, 2015 - ieeexplore.ieee.org
After two decades of intensive development, 3-D integration has proven invaluable for
allowing integrated circuits to adhere to Moore's Law without needing to continuously shrink …

Fabrication and characterization of the capillary performance of superhydrophilic Cu micropost arrays

Y Nam, S Sharratt, C Byon, SJ Kim… - Journal of …, 2010 - ieeexplore.ieee.org
We report the fabrication of dense arrays of super-hydrophilic Cu microposts at solid
fractions as high as 58% and aspect ratios as high as four using electrochemical deposition …

Failure mechanisms and optimum design for electroplated copper through-silicon vias (TSV)

X Liu, Q Chen, P Dixit, R Chatterjee… - 2009 59th Electronic …, 2009 - ieeexplore.ieee.org
Through-silicon vias (TSVs) have garnered a lot of interest in recent years because TSV is a
key enabling technology for three dimensional (3D) integrated circuit (IC) stacking, silicon …

Effect of tool electrode roughness on the geometric characteristics of through-holes formed by ECDM

J Arab, HK Kannojia, P Dixit - Precision Engineering, 2019 - Elsevier
Experimental investigation into the effect of tool electrode roughness on the geometric
characteristics of through-holes formed in glass substrate by electrochemical discharge …

Microsystems using three-dimensional integration and TSV technologies: Fundamentals and applications

Z Wang - Microelectronic Engineering, 2019 - Elsevier
As a powerful enabling technology, three-dimensional (3D) integration, which uses wafer
bonding to integrate multiple wafers in the vertical direction and uses through‑silicon-vias …

Benzyl-containing quaternary ammonium salt as a new leveler for microvia copper electroplating

Y Meng, M Zhou, W Huang, Y Min, X Shen, Q Xu - Electrochimica Acta, 2022 - Elsevier
Recently, quaternary ammonium salt is considered as an effective leveler because of its
easy adsorption on the cathode surface. However, quaternary ammonium salt compounds …

Electrochemical behaviors of Janus Green B in through-hole copper electroplating: An insight by experiment and density functional theory calculation using Safranine …

C Wang, J Zhang, P Yang, M An - Electrochimica Acta, 2013 - Elsevier
Janus Green B (JGB) and Safranine T (ST) were used as levelers in the through-hole (TH)
copper electroplating experiments. Although JGB and ST have a similar part in the structure …

Electrochemical and in situ FTIR spectroscopic studies of gentian violet as a novel leveler in through-holes metallization for printed circuit board applications

ZY Wang, L **, G Li, JQ Yang, WQ Li, DP Zhan… - Electrochimica …, 2022 - Elsevier
An organic additive, gentian violet (GVT), is explored for the first time as a novel leveler with
excellent property in through-holes (THs) metallization of Cu electronic plating in acidic …

A review on microholes formation in glass-based substrates by electrochemical discharge drilling for MEMS applications

T Singh, J Arab, P Dixit - Machining Science and Technology, 2022 - Taylor & Francis
Continuous demands to develop advanced radio-frequency transmission at higher
frequencies have initiated glass-based materials as a substrate in radio-frequency micro …