In ambient atmospheres, aluminum becomes rapidly coated with a compact 2–3 nm thick
oxide layer. This native oxide layer prevents the metal surface from further oxidation …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Atomic layer deposition (ALD) relies on alternated, self-limiting reactions between gaseous
reactants and an exposed solid surface to deposit highly conformal coatings with a thickness …

This review highlights the most significant advances of the nanofabrication techniques
reported over the past decade with a particular focus on the approaches tailored towards the …

Recently, with scaling down of semiconductor devices, need for nanotechnology has
increased enormously. For nanoscale devices especially, each of the layers should be as …

Atomic layer deposition (ALD) is an attractive method to deposit thin films for advanced
technological applications such as microelectronics and nanotechnology. One material …

Atomic layer deposition (ALD) represents a unique deposition technique that allows to coat
uniformly various high aspect ratio (HAR) porous nanostructures, in addition to its traditional …

With devices being scaled down to the nanometer regime, the need for atomic thickness
control with high conformality is increasing. Atomic layer deposition (ALD) is a key …

Area-selective atomic layer deposition (AS-ALD) is attracting increasing interest because of
its ability to enable both continued dimensional scaling and accurate pattern placement for …

Chiral mesophases in achiral bent‐shaped molecules have attracted particular attention
since their discovery in the middle 1990s, not only because of their homochirality and …