Oxide semiconductor thin‐film transistors: a review of recent advances

E Fortunato, P Barquinha, R Martins - Advanced materials, 2012 - Wiley Online Library
Transparent electronics is today one of the most advanced topics for a wide range of device
applications. The key components are wide bandgap semiconductors, where oxides of …

Amorphous oxide semiconductors: From fundamental properties to practical applications

B Lu, F Zhuge, Y Zhao, YJ Zeng, L Zhang… - Current Opinion in Solid …, 2023 - Elsevier
Amorphous oxide semiconductors (AOSs) have exceptional features of high visible
transparency, high carrier mobility, excellent uniformity, and low-temperature growth …

Photon-accelerated negative bias instability involving subgap states creation in amorphous In–Ga–Zn–O thin film transistor

H Oh, SM Yoon, MK Ryu, CS Hwang, S Yang… - Applied physics …, 2010 - pubs.aip.org
We investigated the visible photon accelerated negative bias instability (NBI) in amorphous
In–Ga–Zn–O (a-IGZO) thin film transistor (TFT). As reported in previous works, the rigid shift …

The status and perspectives of metal oxide thin-film transistors for active matrix flexible displays

JK Jeong - Semiconductor Science and Technology, 2011 - iopscience.iop.org
The purpose of this paper is to give an overview of the state-of-the-art of metal oxide thin-film
transistors (TFTs). First, the question of how to achieve high-performance oxide TFTs is …

Effect of high-pressure oxygen annealing on negative bias illumination stress-induced instability of InGaZnO thin film transistors

KH Ji, JI Kim, HY Jung, SY Park, R Choi… - Applied Physics …, 2011 - pubs.aip.org
Negative-bias illumination stress (NBIS) of amorphous InGaZnO (IGZO) transistors can
cause a large negative shift (> 7.1 V) in threshold voltage, something frequently attributed to …

Photo-bias instability of metal oxide thin film transistors for advanced active matrix displays

JK Jeong - Journal of Materials Research, 2013 - cambridge.org
Metal oxide optoelectronics is an emerging field that exploits the intriguing properties of the
ns orbital-derived isotropic band structure as a replacement for traditional silicon-based …

Role of dopants as a carrier suppressor and strong oxygen binder in amorphous indium-oxide-based field effect transistor

S Parthiban, JY Kwon - Journal of Materials Research, 2014 - cambridge.org
In this review, we discuss the recent developments of high-performance and improved-
stability of indium-oxide-based transparent amorphous-oxide semiconductor (TAOS) thin …

Overview of electroceramic materials for oxide semiconductor thin film transistors

JS Park, H Kim, ID Kim - Journal of electroceramics, 2014 - Springer
The flat panel display (FPD) market has been experiencing a rapid transition from liquid
crystal (LC) to organic light emitting diode (OLED) displays, leading, in turn, to the …

Instability of amorphous oxide semiconductors via carrier‐mediated structural transition between disorder and peroxide state

HH Nahm, YS Kim, DH Kim - physica status solidi (b), 2012 - Wiley Online Library
The excited holes occupying the valence band tail (VBT) states in amorphous oxide
semiconductors (AOS) are found to induce formation of meta‐stable \rmO_2^\rm2- peroxide …

Synthesis of Vacancy-Controlled Copper Iodide Semiconductor for High-Performance p-Type Thin-Film Transistors

HA Lee, K Yatsu, TI Kim, HI Kwon… - ACS Applied Materials & …, 2022 - ACS Publications
Copper iodide (CuI) has emerged as a promising p-type semiconductor material owing to its
excellent carrier mobility, high transparency, and solution processability. Although CuI has …