Atomic Layer Deposition: An Overview | Chemical Reviews ACS ACS Publications C&EN CAS
Find my institution Log In Chemical Reviews ACS Publications. Most Trusted. Most Cited. Most …

Localized surface plasmon resonance (LSPR) spectroscopy of metallic nanoparticles is a
powerful technique for chemical and biological sensing experiments. Moreover, the LSPR is …

Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Wide band gap semiconductors are essential for today's electronic devices and energy
applications because of their high optical transparency, controllable carrier concentration …

Over the last few decades there has been a huge interest in nanostructured functional
materials and assembly techniques for preparing functional molecular assemblies with …

This review highlights the most significant advances of the nanofabrication techniques
reported over the past decade with a particular focus on the approaches tailored towards the …

We survey progress in the PCM field over the past five years, ranging from large-scale PCM
demonstrations to materials improvements for high–temperature retention and faster …

We introduce high surface area ZnO nanotube photoanodes templated by anodic aluminum
oxide for use in dye-sensitized solar cells (DSSCs). Atomic layer deposition is utilized to coat …

Recently, with scaling down of semiconductor devices, need for nanotechnology has
increased enormously. For nanoscale devices especially, each of the layers should be as …