Functional oxides are an untapped resource for futuristic devices and functionalities. These
functionalities can range from high temperature superconductivity to multiferroicity and novel …

The review focuses on ALD precursors of selected elements such as alkaline earth (Mg, Ca,
Sr, Ba), group 4 metals, bismuth, silver, iridium, selenium, tellurium and antimony. These …

Atomic layer deposition (ALD) is a proven technique for the conformal deposition of oxide
thin films with nanoscale thickness control. Most successful industrial applications have …

The current work explores the crystalline perovskite oxide, strontium hafnate, as a potential
high-k gate dielectric for Ge-based transistors. SrHfO 3 (SHO) is grown directly on Ge by …

Epitaxial strontium titanate (STO) films have been grown by atomic layer deposition (ALD)
on Si (001) substrates with a thin STO buffer layer grown by molecular beam epitaxy (MBE) …

The effective operation of atomic layer deposition (ALD) feeding system is the premise of
realizing specific ALD processes. In the present work, a detailed computational fluid …

This work demonstrates the growth of crystalline SrTiO3 (STO) directly on germanium via a
chemical method. After thermal deoxidation, the Ge substrate is transferred in vacuo to the …

In this study, we investigate the changes in the crystalline structure of MBE-deposited SrTiO3
layers on Si with different deviations from Sr/Ti stoichiometry as deposited but also after …

The atomic layer deposition (ALD) of SrO thin films from Sr (C 5 i Pr 3 H 2) 2 (g) and H 2 O
(g) was studied using real-time spectroscopic ellipsometry (SE) investigations of adsorption …

The epitaxial growth of functional oxides on silicon substrates requires atomically defined
surfaces, which are most effectively prepared using Sr-induced deoxidation. The …