Defect engineering in SiC technology for high-voltage power devices
T Kimoto, H Watanabe - Applied Physics Express, 2020 - iopscience.iop.org
Major features of silicon carbide (SiC) power devices include high blocking voltage, low on-
state loss, and fast switching, compared with those of the Si counterparts. Through recent …
state loss, and fast switching, compared with those of the Si counterparts. Through recent …
Material science and device physics in SiC technology for high-voltage power devices
T Kimoto - Japanese Journal of Applied Physics, 2015 - iopscience.iop.org
Power semiconductor devices are key components in power conversion systems. Silicon
carbide (SiC) has received increasing attention as a wide-bandgap semiconductor suitable …
carbide (SiC) has received increasing attention as a wide-bandgap semiconductor suitable …
Wide-bandgap semiconductor materials: For their full bloom
S Fujita - Japanese journal of applied physics, 2015 - iopscience.iop.org
Wide-bandgap semiconductors are expected to be applied to solid-state lighting and power
devices, supporting a future energy-saving society. While GaN-based white LEDs have …
devices, supporting a future energy-saving society. While GaN-based white LEDs have …
[HTML][HTML] Silicon carbide: A unique platform for metal-oxide-semiconductor physics
A sustainable energy future requires power electronics that can enable significantly higher
efficiencies in the generation, distribution, and usage of electrical energy. Silicon carbide …
efficiencies in the generation, distribution, and usage of electrical energy. Silicon carbide …
Reduction of deep levels and improvement of carrier lifetime in n-type 4H-SiC by thermal oxidation
T Hiyoshi, T Kimoto - Applied Physics Express, 2009 - iopscience.iop.org
Significant reduction of major deep levels in n-type 4H-SiC (0001) epilayers by means of
thermal oxidation is demonstrated. By thermal oxidation of epilayers at 1150–1300 C, the …
thermal oxidation is demonstrated. By thermal oxidation of epilayers at 1150–1300 C, the …
Performance and ruggedness of 1200V SiC—Trench—MOSFET
D Peters, R Siemieniec, T Aichinger… - … Devices and IC's …, 2017 - ieeexplore.ieee.org
This paper describes a novel SiC trench MOSFET concept. The device is designed to
balance low conduction losses with Si-IGBT like reliability. Basic features of the static and …
balance low conduction losses with Si-IGBT like reliability. Basic features of the static and …
Generation of very fast states by nitridation of the SiO2/SiC interface
H Yoshioka, T Nakamura, T Kimoto - Journal of Applied Physics, 2012 - pubs.aip.org
Fast states at SiO 2/SiC interfaces annealed in NO at 1150–1350 C have been investigated.
The response frequency of the interface states was measured by the conductance method …
The response frequency of the interface states was measured by the conductance method …
Current status and perspectives of ultrahigh-voltage SiC power devices
T Kimoto, Y Yonezawa - Materials Science in Semiconductor Processing, 2018 - Elsevier
Recent progress in the SiC material and ultrahigh-voltage devices is reviewed. Regarding
the material issues, fast epitaxial growth of high-purity epitaxial layers and reduction of basal …
the material issues, fast epitaxial growth of high-purity epitaxial layers and reduction of basal …
Design and formation of SiC (0001)/SiO2 interfaces via Si deposition followed by low-temperature oxidation and high-temperature nitridation
T Kobayashi, T Okuda, K Tachiki, K Ito… - Applied Physics …, 2020 - iopscience.iop.org
We report an effective approach to reduce defects at a SiC/SiO 2 interface. Since oxidation
of SiC may inevitably lead to defect creation, the idea is to form the interface without …
of SiC may inevitably lead to defect creation, the idea is to form the interface without …
Improved channel mobility in 4H-SiC MOSFETs by boron passivation
D Okamoto, M Sometani, S Harada… - IEEE Electron …, 2014 - ieeexplore.ieee.org
We propose another process for fabricating 4H-SiC metal-oxide-semiconductor field-effect
transistors (MOSFETs) with high channel mobility. The B atoms were introduced into a SiO …
transistors (MOSFETs) with high channel mobility. The B atoms were introduced into a SiO …