Temperature-dependent photodetection behavior of AlGaN/GaN-based ultraviolet phototransistors

L Yang, H Zhang, Y Sun, K Hu, Z **ng, K Liang… - Applied Physics …, 2022 - pubs.aip.org
In this work, we investigated the temperature-dependent photodetection behavior of a high-
performance AlGaN/GaN-based ultraviolet phototransistor (UVPT) operating under 265 nm …

3.3 kV multi-channel AlGaN/GaN Schottky barrier diodes with P-GaN termination

M **ao, Y Ma, K Cheng, K Liu, A **e… - IEEE Electron …, 2020 - ieeexplore.ieee.org
This work demonstrates five-channel AlGaN/GaN Schottky barrier diodes (SBDs) fabricated
on a 4-inch wafer with a sheet resistance of 115 Ω/sq. A novel edge termination based on …

MBE-Regrown Ohmics in InAlN HEMTs With a Regrowth Interface Resistance of 0.05

J Guo, G Li, F Faria, Y Cao, R Wang… - IEEE Electron device …, 2012 - ieeexplore.ieee.org
Nonalloyed ohmic contacts regrown by molecular beam epitaxy were made on
InAlN/AlN/GaN/SiC high-electron-mobility transistors (HEMTs). Transmission-line-method …

Analysis of degradation mechanisms in lattice-matched InAlN/GaN high-electron-mobility transistors

J Kuzmik, G Pozzovivo, C Ostermaier… - Journal of Applied …, 2009 - pubs.aip.org
We address degradation aspects of lattice-matched unpassivated InAlN/GaN high-electron-
mobility transistors (HEMTs). Stress conditions include an off-state stress, a semi-on stress …

A comprehensive computational modeling approach for AlGaN/GaN HEMTs

V Joshi, A Soni, SP Tiwari… - IEEE Transactions on …, 2016 - ieeexplore.ieee.org
This paper for the first time presents a comprehensive computational modeling approach for
AlGaN/GaN high electron mobility transistors. Impact of the polarization charge at different …

Current deep level transient spectroscopy analysis of AlInN/GaN high electron mobility transistors: Mechanism of gate leakage

W Chikhaoui, JM Bluet, MA Poisson, N Sarazin… - Applied Physics …, 2010 - pubs.aip.org
In order to assess possible mechanisms of gate reverse-bias leakage current in AlInN/GaN
high electron mobility transistors (HEMTs) grown by metalorganic chemical-vapor deposition …

The effect of AlN interlayer thicknesses on scattering processes in lattice-matched AlInN/GaN two-dimensional electron gas heterostructures

A Teke, S Gökden, R Tülek, JH Leach… - New Journal of …, 2009 - iopscience.iop.org
The scattering mechanisms governing the transport properties of high mobility
AlInN/AlN/GaN two-dimensional electron gas (2DEG) heterostructures with various AIN …

MBE growth of high conductivity single and multiple AlN/GaN heterojunctions

Y Cao, K Wang, G Li, T Kosel, H **ng, D Jena - Journal of Crystal Growth, 2011 - Elsevier
Record-low sheet-resistance of∼ 128Ω/sq have been obtained in two-dimensional electron
gases at ultrathin single AlN/GaN heterojunctions by optimizing the metal fluxes used in …

Comparison of methods for accurate characterization of interface traps in GaN MOS-HFET devices

N Ramanan, B Lee, V Misra - IEEE Transactions on Electron …, 2015 - ieeexplore.ieee.org
Reliability of dielectrics is a critical concern in GaN metal-oxide-semiconductor-
heterojunction-field-effect transistor (MOS-HFET) devices for use in high-voltage power and …

GaN-based high-electron-mobility transistor structures with homogeneous lattice-matched InAlN barriers grown by plasma-assisted molecular beam epitaxy

SW Kaun, E Ahmadi, B Mazumder, F Wu… - Semiconductor …, 2014 - iopscience.iop.org
Abstract Metal-polar In 0.17 Al 0.83 N barriers, lattice-matched to GaN, were grown under N-
rich conditions by plasma-assisted molecular beam epitaxy. The compositional homogeneity …