Rigorous method for compensation selection and alignment of microlithographic optical systems

HN Chapman, DW Sweeney - … Lithographic Technologies II, 1998 - spiedigitallibrary.org
The assembly of an optical system requires the correction of aberrations in the entire
imaging field by making selected rigid-body motions of the optical elements. We present a …

High-precision method for submicron-aperture fiber point-diffraction wavefront measurement

D Wang, Y Xu, R Liang, M Kong, J Zhao, B Zhang… - Optics …, 2016 - opg.optica.org
It is a key issue to measure the point-diffraction wavefront error, which determines the
achievable accuracy of point-diffraction interferometer (PDI). A high-precision method based …

Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions

DT Attwood, P Naulleau, KA Goldberg… - IEEE Journal of …, 1999 - ieeexplore.ieee.org
Undulator radiation, generated by relativistic electrons traversing a periodic magnet
structure, can provide a continuously tunable source of very bright and partially coherent …

[HTML][HTML] Science with soft X rays

N Smith - Physics Today, 2001 - pubs.aip.org
Researchers using synchrotron radiation fall into two fairly distinct camps: users of the soft x-
ray and vacuum ultraviolet (VUV) region of the spectrum and users of the hard x-ray region …

EUV wavefront metrology at EUVA

C Ouchi, S Kato, M Hasegawa… - … Process Control for …, 2006 - spiedigitallibrary.org
Precise measurements of the wavefront aberrations of projection optics with 0.1 nm RMS
accuracy are indispensable to develop the extreme ultraviolet (EUV) lithography. In order to …

Systematic error analysis and correction in quadriwave lateral shearing interferometer

W Zhu, J Li, L Chen, D Zheng, Y Yang, Z Han - Optics Communications, 2016 - Elsevier
To obtain high-precision and high-resolution measurement of dynamic wavefront, the
systematic error of the quadriwave lateral shearing interferometer (QWLSI) is analyzed and …

Phase-shifting point-diffraction interferometry at 193 nm

SH Lee, P Naulleau, KA Goldberg, F Piao, W Oldham… - Applied …, 2000 - opg.optica.org
Phase-shifting point-diffraction interferometry at the 193-nm wavelength suitable for highly
accurate measurement of wave-front aberration is introduced. The interferometer preserves …

Sub-100-nm lithographic imaging with an EUV 10x microstepper

JEM Goldsmith, KW Berger… - Emerging …, 1999 - spiedigitallibrary.org
The capabilities of the EUV 10x microstepper have been substantially improved over the
past year. The key enhancement was the development of a new projection optics system …

Apparatus for generating partially coherent radiation

PP Naulleau - US Patent 6,798,494, 2004 - Google Patents
The effective coherence of an undulator beamline can be tailored to projection lithography
requirements by using a Simple Single moving element and a simple Stationary low cost …

Interferometric at-wavelength flare characterization of EUV optical systems

PP Naulleau, KA Goldberg - US Patent 6,233,056, 2001 - Google Patents
The extreme ultraviolet (EUV) phase-shifting point diffrac tion interferometer (PS/PDI)
provides the high-accuracy wavefront characterization critical to the development of EUV …