Turnitin
降AI改写
早检测系统
早降重系统
Turnitin-UK版
万方检测-期刊版
维普编辑部版
Grammarly检测
Paperpass检测
checkpass检测
PaperYY检测
Review of silicon carbide power devices and their applications
Silicon carbide (SiC) power devices have been investigated extensively in the past two
decades, and there are many devices commercially available now. Owing to the intrinsic …
decades, and there are many devices commercially available now. Owing to the intrinsic …
[HTML][HTML] Review of silicon carbide processing for power MOSFET
C Langpoklakpam, AC Liu, KH Chu, LH Hsu, WC Lee… - Crystals, 2022 - mdpi.com
Owing to the superior properties of silicon carbide (SiC), such as higher breakdown voltage,
higher thermal conductivity, higher operating frequency, higher operating temperature, and …
higher thermal conductivity, higher operating frequency, higher operating temperature, and …
P-type β-gallium oxide: A new perspective for power and optoelectronic devices
Wide-bandgap semiconductors (WBG) are expected to be applied to solid-state lighting and
power devices, supporting a future energy-saving society. Here we present evidence of p …
power devices, supporting a future energy-saving society. Here we present evidence of p …
[書籍][B] Gallium nitride and silicon carbide power devices
BJ Baliga - 2016 - books.google.com
During the last 30 years, significant progress has been made to improve our understanding
of gallium nitride and silicon carbide device structures, resulting in experimental …
of gallium nitride and silicon carbide device structures, resulting in experimental …
Fluorine-implanted termination for vertical GaN Schottky rectifier with high blocking voltage and low forward voltage drop
S Han, S Yang, K Sheng - IEEE Electron Device Letters, 2019 - ieeexplore.ieee.org
In this letter, fluorine-implanted termination (FIT) has been demonstrated in vertical GaN-on-
GaN Schottky barrier diodes (SBDs). Owing to the unique feature of F ions that can become …
GaN Schottky barrier diodes (SBDs). Owing to the unique feature of F ions that can become …
Simulation and experimental study on the junction termination structure for high-voltage 4H-SiC PiN diodes
T Hiyoshi, T Hori, J Suda… - IEEE Transactions on …, 2008 - ieeexplore.ieee.org
Designing and fabrication of 10-kV 4H-SiC PiN diodes with an improved junction termination
structure have been investigated. An improved bevel mesa structure and a single-zone …
structure have been investigated. An improved bevel mesa structure and a single-zone …
Area-efficient bevel-edge termination techniques for SiC high-voltage devices
This paper reviews the bevel-edge termination techniques for silicon carbide (SiC) power
devices, such as bevel junction termination extension (JTE), resistive-bevel termination …
devices, such as bevel junction termination extension (JTE), resistive-bevel termination …
Characteristics of AlGaN/GaN HEMTs with various field-plate and gate-to-drain extensions
HC Chiu, CW Yang, HC Wang… - IEEE transactions on …, 2013 - ieeexplore.ieee.org
AlGaN/GaN high-electron-mobility transistors (HEMTs) with various field-plate (FP) and gate-
to-drain distance extensions are fabricated and investigated. Experiments are carried out on …
to-drain distance extensions are fabricated and investigated. Experiments are carried out on …
Detailed analysis on determining effective dose for various JTE-based edge terminations utilized on 4H-SiC power devices
The article discusses the impact of thermal oxidation process conditions on the implanted
junction-termination-extension (JTE) dose using various edge termination structures for …
junction-termination-extension (JTE) dose using various edge termination structures for …