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Metrology for the next generation of semiconductor devices
The semiconductor industry continues to produce ever smaller devices that are ever more
complex in shape and contain ever more types of materials. The ultimate sizes and …
complex in shape and contain ever more types of materials. The ultimate sizes and …
[HTML][HTML] GLAD based advanced nanostructures for diversified biosensing applications: recent progress
Glancing angle deposition (GLAD) is a technique for the fabrication of sculpted micro-and
nanostructures under the conditions of oblique vapor flux incident and limited adatom …
nanostructures under the conditions of oblique vapor flux incident and limited adatom …
[KSIĄŻKA][B] Metrology and Diagnostic Techniques for Nanoelectronics
Z Ma, DG Seiler - 2017 - taylorfrancis.com
Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …
7/5nm logic manufacturing capabilities and requirements of metrology
B Bunday, AF Bello, E Solecky… - … , Inspection, and Process …, 2018 - spiedigitallibrary.org
This paper will provide an update to previous works [2][4][9] to our view of the future for in-
line high volume manufacturing (HVM) metrology for the semiconductor industry …
line high volume manufacturing (HVM) metrology for the semiconductor industry …
Development of a Ti/Au TES microcalorimeter array as a backup sensor for the Athena/X-IFU instrument
K Nagayoshi, ML Ridder, MP Bruijn, L Gottardi… - Journal of Low …, 2020 - Springer
We are develo** a transition edge sensor (TES) microcalorimeter array based on a Ti/Au
superconducting bilayer, as a backup option for the X-IFU instrument on the Athena X-ray …
superconducting bilayer, as a backup option for the X-IFU instrument on the Athena X-ray …
Metrology capabilities and needs for 7nm and 5nm logic nodes
B Bunday, E Solecky, A Vaid… - … , and Process Control …, 2017 - spiedigitallibrary.org
This paper will provide a high level overview of the future for in-line high volume
manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic …
manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic …
Electron Beam Interaction with Carbon Nanotubes in Scanning Electron Microscope: Mechanisms and Applications
G Chen, Z Yuan, Y Wei, X Fu… - Advanced Functional …, 2024 - Wiley Online Library
A comprehensive understanding of the interaction between electron beams and carbon
nanotubes (CNTs) in scanning electron microscope (SEM) can be challenging due to the …
nanotubes (CNTs) in scanning electron microscope (SEM) can be challenging due to the …
[HTML][HTML] Nebula: Monte Carlo simulator of electron–matter interaction
L van Kessel, CW Hagen - SoftwareX, 2020 - Elsevier
Monte Carlo simulations are frequently used to describe electron–matter interaction in the 0–
50 keV energy range. It often takes hours to simulate electron microscope images using first …
50 keV energy range. It often takes hours to simulate electron microscope images using first …
HVM metrology challenges towards the 5nm node
B Bunday - Metrology, Inspection, and Process Control for …, 2016 - spiedigitallibrary.org
This paper will provide a high level overview of the future for in-line high volume
manufacturing (HVM) metrology for the semiconductor industry. First, we will take a broad …
manufacturing (HVM) metrology for the semiconductor industry. First, we will take a broad …
Electron Inelastic Mean Free Paths for LiF, CaF2, Al2O3, and Liquid Water from 433 keV down to the Energy Gap
We report new calculations, which include the influence of the band gap and exciton states,
of the electron inelastic mean free path (IMFP) for liquid water, LiF, CaF2, and Al2O3 from …
of the electron inelastic mean free path (IMFP) for liquid water, LiF, CaF2, and Al2O3 from …