Thin and locally dislocation-free SiGe virtual substrate fabrication by lateral selective growth

Effect of Incident Energy on Deposition of Ge0.2Si0.8 Films on Ge Substrate: A Molecular Dynamics Study

C **e, T Lin, D Liang, H Huang… - 2024 3rd International …, 2024 - ieeexplore.ieee.org
Due to its excellent electronic and optical properties, Ge/GeSi substrates have significant
potential for application in the development of integrated circuits and optoelectronic devices …
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