With the down-scaling of CMOS technology, the design complexity of very large-scale
integrated is increasing. Although the application of machine learning (ML) techniques in …

Due to the increasing size of integrated circuits (ICs), their design and optimization phases
(ie, computer-aided design, CAD) grow increasingly complex. At design time, a large design …

Computational lithography provides algorithmic and mathematical support for resolution
enhancement in optical lithography, which is the critical step in semiconductor …

As one of the key techniques for resolution enhancement technologies (RETs), optical
proximity correction (OPC) suffers from prohibitive computational costs as feature sizes …

Optical proximity correction (OPC) is a widely-used resolution enhancement technique
(RET) for printability optimization. Recently, rigorous numerical optimization and fast …

We introduce neural lithography to address the 'design-to-manufacturing'gap in
computational optics. Computational optics with large design degrees of freedom enable …

Mask optimization, a compensation method for the thick mask effect and the optical proximity
effect in projection lithography, is essential for advanced EUV-enabled production nodes …

Lithography, transferring chip design masks to the silicon wafer, is the most important phase
in modern semiconductor manufacturing flow. Due to the limitations of lithography systems …

Neural network-based inverse lithography technology (NNILT) has been used to improve
the computational efficiency of large-scale mask optimization for advanced …

Semiconductor lithography is a key process for fabricating integrated circuits, but it suffers
from various distortions and variations that affect the quality of the printed patterns. Optical …