Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

This review comprehensively surveys the latest advancements in surface modification of
pure magnesium (Mg) in recent years, with a focus on various cost-effective procedures …

Coating of metallic industrial parts with titanium nitride (TiN) is widely used with the aim to
improve the mechanical and tribological properties of these parts. In the present work, TiN …

Abstract Titanium Nitride (TiN) films were obtained using the grid-assisted magnetron
sputtering deposition technique on Al substrates in two conditions: under constant and …

The pulsed dc magnetron technique was used for generating TiO x nanoparticles by
sputtering from a titanium target in a gas aggregation source. It was observed that the …

Anode geometry can play a crucial role in magnetron sputtering deposition. In this work, we
investigated the use of five different ring anodes placed in front of the target. Their effects in …

The grid-assisted magnetron sputtering is a variation of the magnetron sputtering commonly
used for thin film deposition. In this work, Langmuir probe measurements were performed in …

Many failure modes in engineering applications (such as corrosion and wear) are related to
surface performance and can be avoided or minimized by proper material selection. The …

Current–voltage relations were measured in an unbalanced grid-assisted magnetron
sputtering system at different inter-electrode distances and magnetic field configurations …