[HTML][HTML] Conductive nitrides: Growth principles, optical and electronic properties, and their perspectives in photonics and plasmonics
The nitrides of most of the group IVb-Vb-VIb transition metals (TiN, ZrN, HfN, VN, NbN, TaN,
MoN, WN) constitute the unique category of conductive ceramics. Having substantial …
MoN, WN) constitute the unique category of conductive ceramics. Having substantial …
Structure and properties of TiN coatings
JE Sundgren - Thin solid films, 1985 - Elsevier
During the last few years there has been increasing interest in TiN thin films deposited by
various physical vapour deposition methods. Since the films are grown by various …
various physical vapour deposition methods. Since the films are grown by various …
Oxides and nitrides as alternative plasmonic materials in the optical range
As alternatives to conventional metals, new plasmonic materials offer many advantages in
the rapidly growing fields of plasmonics and metamaterials. These advantages include low …
the rapidly growing fields of plasmonics and metamaterials. These advantages include low …
Titanium nitride as a plasmonic material for visible and near-infrared wavelengths
The search for alternative plasmonic materials with improved optical properties, easier
fabrication and integration capabilities over those of the traditional materials such as silver …
fabrication and integration capabilities over those of the traditional materials such as silver …
Reactive-sputter-deposited TiN films on glass substrates
J Pelleg, LZ Zevin, S Lungo, N Croitoru - Thin solid films, 1991 - Elsevier
Sputter-deposited TiN thin films on glass substrate were investigated by X-ray diffraction
analysis. The lattice parameter determined on the basis of (200) and (220) peaks is smaller …
analysis. The lattice parameter determined on the basis of (200) and (220) peaks is smaller …
Growth of single‐crystal TiN/VN strained‐layer superlattices with extremely high mechanical hardness
Single-crystal TiN/VN strained-layer § uperlattices (SLS's) with layer thicknesses lEN= lVN=
A 12 (where). is the period of the superlattice) ranging from 0.75 to 16 nm have been grown …
A 12 (where). is the period of the superlattice) ranging from 0.75 to 16 nm have been grown …
Thermal stability of nitride thin films
L Hultman - Vacuum, 2000 - Elsevier
This paper is a review of the thermal stability of state-of-the-art transition metal nitride thin
films synthesized by physical vapour deposition techniques. Nitrides are successfully …
films synthesized by physical vapour deposition techniques. Nitrides are successfully …
[LIBRO][B] Film deposition by plasma techniques
M Konuma - 2012 - books.google.com
Properties of thin films depend strongly upon the deposition technique and conditions
chosen. In order to achieve the desired film, optimum deposition conditions have to be found …
chosen. In order to achieve the desired film, optimum deposition conditions have to be found …
Surface characterisation of plasma-nitrided titanium: an XPS study
I Bertoti, M Mohai, JL Sullivan, SO Saied - Applied surface science, 1995 - Elsevier
DC plasma nitriding was applied to titanium metal sheets in a commercial cell using Ar+
NH3 as the admixture and the nitrided surface investigated by means of XPS. As a …
NH3 as the admixture and the nitrided surface investigated by means of XPS. As a …
Titanium nitride films for ultrasensitive microresonator detectors
HG Leduc, B Bumble, PK Day, BH Eom, J Gao… - Applied Physics …, 2010 - pubs.aip.org
Titanium nitride (TiN x) films are ideal for use in superconducting microresonator detectors
for the following reasons:(a) the critical temperature varies with composition (0< T c< 5 …
for the following reasons:(a) the critical temperature varies with composition (0< T c< 5 …