Rational design of ZnO: H/ZnO bilayer structure for high-performance thin-film transistors

A Abliz, CW Huang, J Wang, L Xu, L Liao… - … Applied Materials & …, 2016‏ - ACS Publications
The intriguing properties of zinc oxide-based semiconductors are being extensively studied
as they are attractive alternatives to current silicon-based semiconductors for applications in …

Low operating voltage single ZnO nanowire field-effect transistors enabled by self-assembled organic gate nanodielectrics

S Ju, K Lee, DB Janes, MH Yoon, A Facchetti… - Nano …, 2005‏ - ACS Publications
The development of nanowire transistors enabled by appropriate dielectrics is of great
interest for flexible electronic and display applications. In this study, nanowire field-effect …

Enhanced ZnO thin-film transistor performance using bilayer gate dielectrics

FH Alshammari, PK Nayak, Z Wang… - ACS applied materials …, 2016‏ - ACS Publications
We report ZnO TFTs using Al2O3/Ta2O5 bilayer gate dielectrics grown by atomic layer
deposition. The saturation mobility of single layer Ta2O5 dielectric TFT was 0.1 cm2 V–1 s …

High performance ZnO nanowire field effect transistors with organic gate nanodielectrics: effects of metal contacts and ozone treatment

S Ju, K Lee, MH Yoon, A Facchetti, TJ Marks… - …, 2007‏ - iopscience.iop.org
High performance ZnO nanowire field effect transistors (NW-FETs) were fabricated using a
nanoscopic self-assembled organic gate insulator and characterized in terms of …

A low-temperature method for improving the performance of sputter-deposited ZnO thin-film transistors with supercritical fluid

MC Chen, TC Chang, SY Huang, KC Chang… - Applied Physics …, 2009‏ - pubs.aip.org
A low-temperature method, supercritical CO 2 (SCCO 2) fluid technology, is employed to
improve the device properties of ZnO TFT at 150 C⁠. In this work, the undoped ZnO films …

Effect of N2O plasma treatment on the performance of ZnO TFTs

K Remashan, DK Hwang, SD Park… - … and Solid-State …, 2007‏ - iopscience.iop.org
Postfabrication rapid thermal annealing (RTA) and subsequent nitrous oxide plasma
treatment improved the performance of zinc oxide (ZnO) thin-film transistors (TFTs) in terms …

Fabrication and characterizations of ZnO thin film transistors prepared by using radio frequency magnetron sputtering

R Navamathavan, CK Choi, EJ Yang, JH Lim… - Solid-State …, 2008‏ - Elsevier
We report on the performance of the thin film transistors (TFTs) using ZnO as an active
channel layer grown by using radio frequency (rf) magnetron sputtering technique. The TFT …

Room-temperature fabrication of high-performance H doped ZnO thin-film transistors

D Zhu, Z Jiang, W Zhang, D Yin, W Xu, S Han… - Materials Chemistry and …, 2021‏ - Elsevier
We prepared ZnO: H thin films in Ar+ H 2 atmosphere with substrate at room temperature by
magnetron sputtering, the effect of H 2 flow ratio on the properties of thin films and the …

Impact of hydrogen plasma treatment on the electrical performances of ZnO thin-film transistors

J Han, A Abliz, D Wan - Chinese Journal of Physics, 2022‏ - Elsevier
In this study, we investigated the effects of hydrogen plasma (H) treatment on the structure,
surface morphology, and optical and electronic properties of zinc oxide (ZnO) films, and on …

Effects of electrical bias stress on the performance of ZnO-based TFTs fabricated by RF magnetron sputtering

R Navamathavan, EJ Yang, JH Lim… - Journal of The …, 2006‏ - iopscience.iop.org
based thin film transistors (TFTs) were fabricated on a tin oxide (ITO)/glass substrate by
radio frequency (rf) magnetron sputtering at. The transfer characteristics of the fabricated …