Clustering on surfaces

M Zinke-Allmang, LC Feldman, MH Grabow - Surface Science Reports, 1992 - Elsevier
In this review we summarize the current theoretical and experimental understanding of
clustering phenomena on surfaces, with an emphasis on dynamical properties. The basic …

[HTML][HTML] The physics and chemistry of the Schottky barrier height

RT Tung - Applied Physics Reviews, 2014 - pubs.aip.org
The formation of the Schottky barrier height (SBH) is a complex problem because of the
dependence of the SBH on the atomic structure of the metal-semiconductor (MS) interface …

Surfaces of silicon

D Haneman - Reports on Progress in Physics, 1987 - iopscience.iop.org
The author reviews the current state of knowledge of the structure and surface states of
several clean low-index faces of silicon. These are the (100) face, the (111) 7* 7 face, the …

[ΒΙΒΛΙΟ][B] Semiconductor surfaces and interfaces

W Mönch - 2013 - books.google.com
Semiconductor Surfaces and Interfaces deals with structural and electronic properties of
semiconductor surfaces and interfaces. The first part introduces the general aspects of …

Control of InAs nanowire growth directions on Si

K Tomioka, J Motohisa, S Hara, T Fukui - Nano letters, 2008 - ACS Publications
We report on control of growth directions of InAs nanowires on Si substrate. We achieved to
integrate vertical InAs nanowires on Si by modifying initial Si (111) surface in selective-area …

[ΒΙΒΛΙΟ][B] Conjugated Polymer and Molecular Interfaces: Science and Technology for Photonic and Optoelectronic Application

WR Salaneck, K Seki, A Kahn, JJ Pireaux - 2001 - taylorfrancis.com
Conjugated Polymer And Molecular Interfaces Page 1 Page 2 Conjugated Polymer and
Molecular Interfaces kience and Technology for Photonic and Optoelectronic Implication; edited …

III–V nanowires on Si substrate: selective-area growth and device applications

K Tomioka, T Tanaka, S Hara… - IEEE Journal of …, 2010 - ieeexplore.ieee.org
III-V nanowires (NWs) on Si are promising building blocks for future nanoscale electrical and
optical devices on Si platforms. We present position-controlled and orientation-controlled …

Influence of surfactants in Ge and Si epitaxy on Si (001)

M Copel, MC Reuter, MH Von Hoegen, RM Tromp - Physical Review B, 1990 - APS
Epitaxial growth of heterolayers has in the past relied on optimization of growth conditions to
overcome thermodynamic obstacles. When there is an intrinsic tendency of a heterolayer to …

Annealing of heavily arsenic-doped silicon: electrical deactivation and a new defect complex

KC Pandey, A Erbil, GS Cargill III, RF Boehme… - Physical review …, 1988 - APS
Ab initio total-energy calculations indicate that the formation of a new defect complex, a
vacancy surrounded by four arsenic atoms, is responsible for electrical deactivation and for …

Atomic-step rearrangement on Si (100) by interaction with arsenic and the implication for GaAs-on-Si epitaxy

RD Bringans, DK Biegelsen, LE Swartz - Physical Review B, 1991 - APS
The lowest-energy configuration of a class of vicinal Si (100) surfaces has equally spaced
steps, each with a height of two atomic units. This results in a single-domain surface with the …