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Onsite matrix elements of the tight-binding Hamiltonian of a strained crystal: Application to silicon, germanium, and their alloys
We discuss a model for the onsite matrix elements of the sp 3 d 5 s∗ tight-binding
Hamiltonian of a strained diamond or zinc-blende crystal or nanostructure. This model …
Hamiltonian of a strained diamond or zinc-blende crystal or nanostructure. This model …
Assessment of electron mobility in ultrathin-body InGaAs-on-insulator MOSFETs using physics-based modeling
M Poljak, V Jovanovic, D Grgec… - IEEE transactions on …, 2012 - ieeexplore.ieee.org
We have investigated the electron mobility in ultrathin-body InGaAs-on-insulator devices
using physics-based modeling that self-consistently accounts for quantum confinement and …
using physics-based modeling that self-consistently accounts for quantum confinement and …
A compact surface potential model for flexible radio frequency AlGaN/GaN high-electron-mobility transistor
Y Wang, Q Wu, B Yan, R Xu… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
Compact model of flexible radio frequency (RF) electronic devices is crucial for flexible
circuit designs. In this article, a compact model, including external strain effects for flexible …
circuit designs. In this article, a compact model, including external strain effects for flexible …
An exact solution of the linearized Boltzmann transport equation and its application to mobility calculations in graphene bilayers
A Paussa, D Esseni - Journal of Applied Physics, 2013 - pubs.aip.org
This paper revisits the problem of the linearized Boltzmann transport equation (BTE), or,
equivalently, of the momentum relaxation time, momentum relaxation time (MRT), for the …
equivalently, of the momentum relaxation time, momentum relaxation time (MRT), for the …
On the validity of the effective mass approximation and the Luttinger kp model in fully depleted SOI MOSFETs
The confined states in strained silicon fully depleted silicon-on-insulator MOSFETs are
investigated using full-band kp method within the envelope-function approximation. Full …
investigated using full-band kp method within the envelope-function approximation. Full …
Analysis of the performance of n-type FinFETs with strained SiGe channel
This paper reports a simulation study investigating the drive current of a prototypical SiGe n-
type FinFET built on a relaxed SiGe substrate for different values of the Ge content x in the Si …
type FinFET built on a relaxed SiGe substrate for different values of the Ge content x in the Si …
Coupled drift-diffusion (DD) and multi-subband Boltzmann transport equation (MSBTE) solver for 3D multi-gate transistors
This paper presents a self-consistent coupled DD/MSBTE solver for the device simulation of
realistic 3D multi-gate transistors. The MSBTE for quasi-1D k-space is solved in the channel …
realistic 3D multi-gate transistors. The MSBTE for quasi-1D k-space is solved in the channel …
First principles calculation of electron-phonon and alloy scattering in strained SiGe
F Murphy-Armando, S Fahy - Journal of Applied Physics, 2011 - pubs.aip.org
First-principles electronic structure methods are used to predict the mobility of n-type carrier
scattering in strained SiGe. We consider the effects of strain on the electron-phonon …
scattering in strained SiGe. We consider the effects of strain on the electron-phonon …
Theory of hole mobility in strained Ge and III-V p-channel inversion layers with high-κ insulators
We present a comprehensive investigation of the low-field hole mobility in strained Ge and III-
V (GaAs, GaSb, InSb, and In 1− x Ga x As) p-channel inversion layers with both SiO 2 and …
V (GaAs, GaSb, InSb, and In 1− x Ga x As) p-channel inversion layers with both SiO 2 and …
Microscopic modeling of hole inversion layer mobility in unstrained and uniaxially stressed Si on arbitrarily oriented substrates
AT Pham, C Jungemann, B Meinerzhagen - Solid-State Electronics, 2008 - Elsevier
The hole inversion layer mobility of in-plane uniaxially stressed Si is modeled by a
microscopic approach. For an arbitrary crystallographic surface orientation the two …
microscopic approach. For an arbitrary crystallographic surface orientation the two …