Fundamental research on semiconductor SiC and its applications to power electronics

H Matsunami - Proceedings of the Japan Academy, Series B, 2020 - jstage.jst.go.jp
Today, the silicon carbide (SiC) semiconductor is becoming the front runner in advanced
power electronic devices. This material has been considered to be useful for abrasive …

Status and prospects of cubic silicon carbide power electronics device technology

F Li, F Roccaforte, G Greco, P Fiorenza, F La Via… - Materials, 2021 - mdpi.com
Wide bandgap (WBG) semiconductors are becoming more widely accepted for use in power
electronics due to their superior electrical energy efficiencies and improved power densities …

Si-ion implantation do** in β-Ga2O3 and its application to fabrication of low-resistance ohmic contacts

K Sasaki, M Higashiwaki, A Kuramata… - Applied Physics …, 2013 - iopscience.iop.org
We developed a donor do** technique for β-Ga 2 O 3 by using Si-ion (Si+) implantation.
For the implanted Ga 2 O 3 substrates with Si+= 1× 10 19–5× 10 19 cm-3, a high activation …

Single-photon emitting diode in silicon carbide

A Lohrmann, N Iwamoto, Z Bodrog, S Castelletto… - Nature …, 2015 - nature.com
Electrically driven single-photon emitting devices have immediate applications in quantum
cryptography, quantum computation and single-photon metrology. Mature device fabrication …

Native point defects and carbon clusters in 4H-SiC: A hybrid functional study

T Kobayashi, K Harada, Y Kumagai, F Oba… - Journal of Applied …, 2019 - pubs.aip.org
We report first-principles calculations that clarify the formation energies and charge
transition levels of native point defects and carbon clusters in the 4H polytype of silicon …

Threshold voltage instability in 4H-SiC MOSFETs with phosphorus-doped and nitrided gate oxides

H Yano, N Kanafuji, A Osawa… - IEEE Transactions on …, 2014 - ieeexplore.ieee.org
Threshold voltage instability was investigated for 4H-SiC MOSFETs with phosphorus-doped
(POCl3-annealed) and nitrided (NO-annealed) gate oxides. Threshold voltage shift …

[HTML][HTML] Impact of carbon injection in 4H-SiC on defect formation and minority carrier lifetime

ME Bathen, R Karsthof, A Galeckas, P Kumar… - Materials Science in …, 2024 - Elsevier
Point defects in silicon carbide (SiC) can act as charge carrier traps and have a pronounced
impact on material properties such as the mobility and carrier lifetime. Prominent among …

Lifetime‐killing defects in 4H‐SiC epilayers and lifetime control by low‐energy electron irradiation

T Kimoto, K Danno, J Suda - physica status solidi (b), 2008 - Wiley Online Library
Carrier lifetimes in n‐type 4H‐SiC epilayers have been investigated by differential
microwave photoconductance decay measurements. Through a correlation study between …

Interface Properties of 4H-SiC ( ) and ( ) MOS Structures Annealed in NO

S Nakazawa, T Okuda, J Suda… - … on Electron Devices, 2014 - ieeexplore.ieee.org
Interface properties of 4H-SiC (112̅0) and (11̅00) walls, the absence of junction FET
resistance, and the higher metal-oxide-semiconductor (MOS) structures annealed in nitric …

Enhanced annealing of the Z1∕ 2 defect in 4H–SiC epilayers

L Storasta, H Tsuchida, T Miyazawa… - Journal of Applied …, 2008 - pubs.aip.org
The authors investigated the application of the carbon-implantation/annealing method for
the annealing of the main lifetime limiting defect Z 1∕ 2 in thick 4H–SiC epilayers …