In plasma-based deposition processing, the importance of low-energy ion bombardment
during thin film growth can hardly be exaggerated. Ion bombardment is an important …

Microwave discharges (MD) are widely used as a source of non-equilibrium low pressure
plasma for different applications. This paper reviews the methods of microwave plasma …

The authors have done an excellent job of clearly explaining the different nomenclature
used in plasma processing, with the meaning of the symbols and constants commonly …

Plasma processing is a central technique in the fabrication of semiconductor devices. This
self-contained book provides an up-to-date description of plasma etching and deposition in …

There has been a recent rapid expansion of the range of applications of low-temperature
plasma processing in Si-based photovoltaic (PV) technologies. The desire to produce Si …

Diamond etching is characterized using a microwave ECR plasma reactor with regard to
etch rate selectivity, surface morphology, and feature size. Etching is performed on diamond …

BCl3, with addition of N2, Ar or H2, is found to provide smooth anisotropic pattern transfer in
GaAs, GaN, GaP, GaSb and AlGaAs under Inductively Coupled Plasma (ICP) conditions …

The electron cyclotron resonance (ECR) effect in a weakly magnetized capacitively coupled
radio frequency (RF) plasma was previously observed with optical emission spectroscopy …

A Langmuir probe diagnostics is done on the microwave ECR generated plasma in a 2.45
GHz, 1.5 kW facility set up in our laboratory (for thin film deposition) by inserting a probe in …

The evolution of the electron energy distribution function (EEDF) over a weak magnetic field
range is investigated in magnetized radio-frequency (rf) inductive discharges under a …