GaN: Processing, defects, and devices

SJ Pearton, JC Zolper, RJ Shul, F Ren - Journal of applied physics, 1999 - pubs.aip.org
The role of extended and point defects, and key impurities such as C, O, and H, on the
electrical and optical properties of GaN is reviewed. Recent progress in the development of …

Recent developments in rare-earth doped materials for optoelectronics

AJ Kenyon - Progress in Quantum electronics, 2002 - Elsevier
Rare-earth doped materials are of crucial importance to optoelectronics, and are widely
deployed in fibre amplifiers and solid-state lasers. This article summarises the present state …

Erbium implanted thin film photonic materials

A Polman - Journal of applied physics, 1997 - pubs.aip.org
Erbium doped materials are of great interest in thin film integrated optoelectronic technology,
due to their Er 3+ intra-4f emission at 1.54 μm, a standard telecommunication wavelength. Er …

Guiding, modulating, and emitting light on silicon-challenges and opportunities

M Lipson - Journal of Lightwave Technology, 2005 - ieeexplore.ieee.org
Silicon photonics could enable a chip-scale platform for monolithic integration of optics and
microelectronics for applications of optical interconnects in which high data streams are …

Erbium in silicon

AJ Kenyon - Semiconductor Science and Technology, 2005 - iopscience.iop.org
The overlap of the principal luminescence band of the erbium ion with the low-loss optical
transmission window of silica optical fibres, along with the drive for integration of photonics …

Optical addressing of an individual erbium ion in silicon

C Yin, M Rancic, GG De Boo, N Stavrias, JC McCallum… - Nature, 2013 - nature.com
The detection of electron spins associated with single defects in solids is a critical operation
for a range of quantum information and measurement applications under development …

Room‐temperature sharp line electroluminescence at λ= 1.54 μm from an erbium‐doped, silicon light‐emitting diode

B Zheng, J Michel, FYG Ren, LC Kimerling… - Applied Physics …, 1994 - pubs.aip.org
We report the first room‐temperature sharp line electroluminescence of an erbium‐doped
silicon light‐emitting diode at λ= 1.54 μm. The electroluminescence originates from an …

Room‐temperature electroluminescence from Er‐doped crystalline Si

G Franzo, F Priolo, S Coffa, A Polman… - Applied physics …, 1994 - pubs.aip.org
We have obtained room‐temperature electroluminescence (EL) at∼ 1.54 μm from Er and O
co‐doped crystalline p‐n Si diodes fabricated by ion implantation, under both forward and …

[CARTE][B] Ion implantation: basics to device fabrication

E Rimini - 1994 - books.google.com
Ion implantation offers one of the best examples of a topic that starting from the basic
research level has reached the high technology level within the framework of …

Excitation and nonradiative deexcitation processes of in crystalline Si

F Priolo, G Franzò, S Coffa, A Carnera - Physical Review B, 1998 - APS
A detailed investigation on the excitation and deexcitation processes of Er 3+ in Si is
reported. In particular, we explored Er pum** through electron-hole pair recombination …