Inline metrology of high aspect ratio hole tilt and center line shift using small-angle x-ray scattering

P Gin, M Wormington, Y Amasay… - Journal of Micro …, 2023‏ - spiedigitallibrary.org
High aspect ratio (HAR) structures found in three-dimensional nand memory structures have
unique process control challenges. The etch used to fabricate channel holes several …

[HTML][HTML] Complex profile metrology via physical symmetry enhanced small angle x-ray scattering

D Wang, H Liang, H Yang, H Yu - Journal of Applied Physics, 2024‏ - pubs.aip.org
Small angle x-ray scattering (SAXS) stands out as a promising solution in semiconductor
metrology. The critical issue of SAXS metrology is to solve the SAXS inverse problem. With …

X-ray-based overlay metrology using reciprocal space slicing analysis

J Zhang, X Chen, T Yang, S Liu - Optics Letters, 2023‏ - opg.optica.org
Overlay serves as the pivotal performance indicator for lithography tools, and its prompt and
precise measurement significantly underpins the process yield control. At present, diffraction …

X-ray scattering critical dimensional metrology using a compact x-ray source for next generation semiconductor devices

RJ Kline, DF Sunday, D Windover… - Journal of Micro …, 2017‏ - spiedigitallibrary.org
Semiconductor devices continue to shrink in size with every generation. These ever smaller
structures are challenging the resolution limits of current analytical and inline metrology …

Estimation of line cross sections using critical-dimension grazing-incidence small-angle x-ray scattering

G Freychet, D Kumar, RJ Pandolfi, P Naulleau… - Physical Review …, 2019‏ - APS
The semiconductor industry is continuously pushing the limits of photolithography, with
feature sizes now smaller than 10 nm. To ensure quality, it has become necessary to look …

[HTML][HTML] Uncertainty quantification on small angle x-ray scattering measurement using Bayesian deep learning

H Yang, Z Wu, K Zhang, D Wang, H Yu - Journal of Applied Physics, 2024‏ - pubs.aip.org
Small angle x-ray scattering (SAXS) is a widely recognized solution for measuring complex
nanostructures. With the increasing demand for accurately assessing structural …

Characterizing patterned block copolymer thin films with soft x-rays

DF Sunday, J Ren, CD Liman… - Acs Applied Materials …, 2017‏ - ACS Publications
The directed self-assembly (DSA) of block copolymers (BCPs) is a potential solution for
patterning critical features for integrated circuits at future technology nodes. For this process …