Defect structure and electronic properties of SiOC: H films used for back end of line dielectrics
Back end of the line dielectrics (BEOL) with low dielectric constants, so called low-k
dielectrics, are needed for current and future integrated circuit technology nodes. However …
dielectrics, are needed for current and future integrated circuit technology nodes. However …
Defect chemistry and electronic transport in low-κ dielectrics studied with electrically detected magnetic resonance
Defect mediated electronic transport phenomena in low-κ dielectric films are of great
technological interest for state-of-the-art and next generation microprocessors. At the …
technological interest for state-of-the-art and next generation microprocessors. At the …
Band diagram for low-k/Cu interconnects: The starting point for understanding back-end-of-line (BEOL) electrical reliability
The starting point for describing the electrostatic operation of any semiconductor device
begins with a band diagram illustrating changes in the semiconductor Fermi level and the …
begins with a band diagram illustrating changes in the semiconductor Fermi level and the …