Science-based, data-driven developments in plasma processing for material synthesis and device-integration technologies
Low-temperature plasma-processing technologies are essential for material synthesis and
device fabrication. Not only the utilization but also the development of plasma-related …
device fabrication. Not only the utilization but also the development of plasma-related …
Enhancement of electrical characteristics of SnGaO thin-film transistors via argon and oxygen plasma treatment
Y Lu, X Dai, J Yang, Y Liu, D Cao, F Lin, F Liu - Vacuum, 2024 - Elsevier
The impact of Ar or O 2 plasma treatment on the electrical characteristics of SnGaO thin film
transistors (TFTs) fabricated via solution method was examined. The findings of the study …
transistors (TFTs) fabricated via solution method was examined. The findings of the study …
Validation of inductively coupled plasma simulation model by laser Thomson scattering experiment
J Sun, J Shi, Y Li, YQ Liu, Y Zhao, X Zhang… - Journal of Plasma …, 2023 - cambridge.org
To comprehensively study the physical properties of inductively coupled plasma (ICP), a
finite element method (FEM) simulation model of ICP is developed using the well …
finite element method (FEM) simulation model of ICP is developed using the well …
INFLUENCE OF CONFIGURATION OF THE ELECTRODE SYSTEM OF A COAXIAL MAGNETO PLASMA ACCELERATOR ON ARC DISCHARGE FORMATION AND …
АИ Циммерман, ИИ Шаненков… - Bulletin of the Tomsk …, 2023 - izvestiya.tpu.ru
Методы: плазмодинамический синтез, измерение и регистрация импульсных токов и
напряжений, измерение электроэрозии посредством массы эродируемого электрода …
напряжений, измерение электроэрозии посредством массы эродируемого электрода …
Finite element analysis of argon gas plasma produced by inductively coupled plasma method with variable input power, coil position and dielectric thickness.
E Poorreza, N Dadashzadeh - Quarterly Journal of …, 2023 - jphys.journals.pnu.ac.ir
Inductively coupled plasma (ICP) is widely used in applications such as material processing
and microelectronic device fabrication. However, their electromagnetic properties have not …
and microelectronic device fabrication. However, their electromagnetic properties have not …
Влияние конфигурации электродной системы коаксиального магнитоплазменного ускорителя на процесс формирования и развития дугового разряда
АИ Циммерман, ИИ Шаненков… - Известия Томского …, 2023 - earchive.tpu.ru
Актуальность исследования обусловлена широким спектром областей применения
разнообразных видов генераторов плазмы, в том числе, в составе аналитических …
разнообразных видов генераторов плазмы, в том числе, в составе аналитических …