Self-assembled InAs quantum wire lasers on (001) InP at 1.6 μm

F Suárez, D Fuster, L González, Y González… - Applied physics …, 2006‏ - pubs.aip.org
In this work, the authors present results on the growth by atomic layer molecular beam
epitaxy and characterization of lasers with one and three stacked layers of InAs quantum …

Improvement of the Temperature Characteristic of 1.3 µm GaInAsP Laser Diodes with GaInAsP/InP Short-Period Superlattice Barriers

PA Postigo, D Golmayo, H Gómez… - Japanese journal of …, 2002‏ - iopscience.iop.org
We report on the characteristics of tensile-strained 1.3 µm InGaAsP multi-quantum well
lasers with InP/GaInAsP short-period superlattices (SPSLs) in barriers and waveguide …

P-type InP grown at low temperatures by atomic layer molecular beam epitaxy (ALMBE)

ML Dotor, P Huertas, PA Postigo, D Golmayo… - Electronics Letters, 1993‏ - IET
Residual do** of InP layers grown at low temperature by atomic layer molecular beam
epitaxy (ALMBE) has been reduced down to ̃1016cm-3 by control of phosphorus pulses, and …

Electrical and optical properties of Be-doped InP grown at low temperature by solid source atomic layer molecular beam epitaxy

PA Postigo, ML Dotor, P Huertas, F Garcıa… - Journal of applied …, 1999‏ - pubs.aip.org
Beryllium-doped InP layers have been grown by solid source atomic layer molecular beam
epitaxy at low substrate temperature. The residual n-type do** was reduced by controlling …

Self-limiting growth conditions on (001) InP by alternate triethylindium and tertiarybutylphosphine supply in ultrahigh vacuum

N Otsuka, J Nishizawa, H Kikuchi… - Journal of Vacuum …, 1999‏ - pubs.aip.org
Alternate injections of triethylindium (TEI) and tertiarybutylphosphine (TBP) without
precracking were used to realize self-limiting growth of an InP layer on a (001) InP substrate …

Self-limiting growth of InP by alternate trimethylindium and tertiarybutylphosphine supply in ultrahigh vacuum

N Otsuka, J Nishizawa, H Kikuchi, Y Oyama - Journal of crystal growth, 1999‏ - Elsevier
The alternate injection of trimethylindium (TMI) and tertiarybutylphosphine (TBP) without
precracking was studied to expand the self-limiting growth conditions of an InP layer on a …

Self-Limiting Growth of Specular InP Layer by Alternate Injection of Triethylindium and Tertiarybutylphosphine in Ultrahigh Vacuum

N Otsuka, J Nishizawa, H Kikuchi… - Japanese journal of …, 1999‏ - iopscience.iop.org
Alternate injection of triethylindium (TEI) and tertiarybutylphosphine without precracking has
been studied to realize low-temperature growth of an InP layer on an (001) InP substrate in …

InP tunnel junctions grown by atomic layer molecular beam epitaxy on InP and InP-on-Si substrates

ML Dotor, D Golmayo, A Calle, JR Sendra… - Solar energy materials …, 1995‏ - Elsevier
p++/n++ InP tunnel diodes have been fabricated for the first time on InP and Si substrates by
solid source Atomic Layer Molecular Beam Epitaxy (ALMBE) at low temperature. The high …

Analysis of local deformations in heterostructures containing short period superlattices by high-resolution transmission electron microscopy

C Quintana, D Golmayo, ML Dotor… - The European Physical …, 2004‏ - cambridge.org
This work describes the application of the Lattice Fringe Spacing Measurement (LFSM)
method to the study of complex multiquantum well heterostructures containing both low …

Self-limiting submonolayer growth of InP by alternative triethylindium and tertiarybutylphosphine supply in ultra high vacuum

N Otsuka, J Nishizawab, H Kikuchib… - Compound …, 2021‏ - taylorfrancis.com
Alternative injection of triethylindium and tertiarybutylphosphine without pre-cracking has
been used for molecular layer epitaxy to realize a monolayer growth of InP. The growth rate …