A metrology apparatus for determining a characteristic of interest of a structure on a
substrate, the structure having diffractive properties, the apparatus comprising: focusing …

The disclosure is directed to systems for providing illumination to a measurement head for
optical metrology. In some embodiments of the disclosure, illumination beams from a …

Described is a metrology system for determining a characteristic of interest relating to at
least one structure on a substrate, and associated method. The metrology system comprises …

Disclosed is a method of determining a characteristic of interest relating to a structure on a
substrate formed by a lithographic process, the method comprising: obtaining an input …

A mode control system and method for controlling an output mode of a broadband radiation
source including a photonic crystal fiber (PCF). The mode control system includes at least …

(57) ABSTRACT A system for providing illumination to a measurement head for optical
metrology is configured to combine illumination beams from a plurality of illumination …

A method for analyzing a process, the method including obtaining a multi-dimensional
probability density function representing an expected distribution of values for a plurality of …

Disclosed is a method for obtaining a computationally determined interference electric field
describing scattering of radiation by a pair of structures comprising a first structure and a …

(57) ABSTRACT A metrology apparatus for determining a characteristic of interest of a
structure on a substrate, the apparatus compris ing: a radiation source for generating …

A measurement apparatus and method for determining a substrate grid describing a
deformation of a substrate prior to exposure of the substrate in a lithographic apparatus …