Conductive and semiconductive oxides constitute a class of materials of which the electrical
conductivity and optical transparency can be modulated through material design (eg, do** …

Atomic layer deposition (ALD) is a popular deposition technique comprising two or more
sequential, self-limiting surface reactions, which make up an ALD cycle. Energy-enhanced …

Thin tin oxide films are used as spacers in semiconductor device manufacturing. In one
implementation, thin tin oxide film is conformally deposited onto a semiconductor substrate …

Transport layers are of outmost importance for thin‐film solar cells, determining not only their
efficiency but also their stability. To bring one of these thin‐film technologies toward mass …

Indoor organic photovoltaics (OPVs) are currently being investigated for small-scale energy
generation from artificial light sources to power small electronic devices. Despite recent …

Solution-processed metal oxide thin-film transistors (TFTs) operating in enhancement mode
are promising for the next-generation flat panel displays. In this work, we report high-mobility …

The thermal atomic layer etching (ALE) of TiN was demonstrated using a new etching
mechanism based on sequential, self-limiting oxidation and fluorination reactions. The …

Due to the abundance and usefulness of tin oxide for applications such as transparent
conductors, sensors, and catalysts, it is desirable to establish high quality atomic layer …

In this work, we will demonstrate that highly robust TCGDBs can be realized by the use of tin
oxide (SnO x). Conductivities of up to 3× 10 2 S cm− 1 and an extremely low WVTR on the …

Thin films containing germanium or tin have a great variety of current and potential
applications, particularly their oxides or chalcogenides. Chemical vapor deposition (CVD) …