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Pathways for electron device research in the AI era
J Trommer - Device, 2025 - cell.com
With the recent emergence of AI applications, chip designers face new challenges to combat
the immense power needs arising from the new technology. To keep up with the rapid …
the immense power needs arising from the new technology. To keep up with the rapid …
Research on process-induced effect in 14-nm FinFET gate formation and digital unit optimization design
Y Yang, H Xu, T Feng, J Guo… - Journal of …, 2024 - iopscience.iop.org
The advanced fin-shaped field-effect transistor (FinFET) technology offers higher integration
density and stronger channel control capabilities, however, more complex process effects …
density and stronger channel control capabilities, however, more complex process effects …