E-beam lithography is a powerful tool for generating nanostructures and fabricating
nanodevices with fine features approaching a few nanometers in size. However, alternative …

Photolithography is the prevalent microfabrication technology. It needs to meet resolution
and yield demands at a cost that makes it economically viable. However, conventional far …

Nanopatterning for the fabrication of optical metasurfaces entails a need for high-resolution
approaches like electron beam lithography that cannot be readily scaled beyond prototy** …

An electron beam resist is typically applied by spin-coating, which cannot be reliably applied
on nonplanar, irregular, or fragile substrates. Here we demonstrate that the popular negative …

Micro-and nanostructures with three-dimensional (3D) shapes are needed for a variety of
applications in optics and fluidics where structures with both smooth and sharp features …

Dynamic structural color based on tunable optical resonance plays a key role in applications
including encryption visualization, camouflage and colorimetric sensing. However, the …

Grazing‐incidence X‐ray scattering (GIXS) is widely used to analyze the crystallinity and
nanoscale structure in thin polymer films. However, ionizing radiation will generate free …

A high-resolution nanopatterning technique is desirable with the present rapid development
of hydrogel nanodevices. Here, we demonstrate that polyvinyl alcohol (PVA), a popular …

Photoluminescent carbon nanomaterials have been widely studied for their low biological
toxicity, outstanding biocompatibility, unique physical–chemical properties and obvious PL …

Herein, the plasma etching mask transfer of the resistance of e‐beam resists, both negative
and positive, as well as nanoparticle masks and hard masks are investigated. Various …