Voltage contrast inspection of deep trench isolation
N Arnold, J Liu, BW Messenger… - US Patent 8,927,989, 2015 - Google Patents
(57) ABSTRACT A method including forming a first test structure and a second test structure
in electrical contact with an inner buried plate and an outer buried plate, respectively, where …
in electrical contact with an inner buried plate and an outer buried plate, respectively, where …
Building stacked hollow channels for a three dimensional circuit device
Z Lu, R Linsday, SV Koveshnikov - US Patent 11,018,149, 2021 - Google Patents
A three dimensional stacked circuit device includes multiple decks of circuit elements, each
deck including multiple tiers of circuit elements. Each deck includes a highly doped hollow …
deck including multiple tiers of circuit elements. Each deck includes a highly doped hollow …
Semiconductor process using mask openings of varying widths to form two or more device structures
F Hebert, A Gibby, SJ Gaul - US Patent App. 12/794,236, 2011 - Google Patents
0005. It should be noted that some details of the FIGS. have been simplified and are drawn
to facilitate understand ing of the inventive embodiments rather than to maintain strict …
to facilitate understand ing of the inventive embodiments rather than to maintain strict …
eDRAM having dynamic retention and performance tradeoff
KR Erickson, PC Paone, DP Paulsen… - US Patent …, 2013 - Google Patents
(57) ABSTRACT A semiconductor chip has an embedded dynamic random access memory
(eIDRAM) in an independently Voltage con trolled silicon region that is a circuit element …
(eIDRAM) in an independently Voltage con trolled silicon region that is a circuit element …
Independently voltage controlled volume of silicon on a silicon on insulator chip
KR Erickson, PC Paone, DP Paulsen… - US Patent …, 2014 - Google Patents
A semiconductor chip has an independently voltage controlled silicon region that is a circuit
element useful for controlling capacitor values of eDRAM trench capacitors and threshold …
element useful for controlling capacitor values of eDRAM trench capacitors and threshold …
Structures, design structures and methods of fabricating global shutter pixel sensor cells
JW Adkisson, JJ Ellis-Monaghan, MD Jaffe… - US Patent …, 2012 - Google Patents
US8138531B2 - Structures, design structures and methods of fabricating global shutter
pixel sensor cells - Google Patents US8138531B2 - Structures, design structures and …
pixel sensor cells - Google Patents US8138531B2 - Structures, design structures and …
Integrated circuit with vertically structured capacitive element, and its fabricating process
A Marzaki, A Regnier, S Niel, Q Hubert… - US Patent …, 2020 - Google Patents
A capacitive element includes a trench extending vertically into a well from a first side. The
trench is filled with a conductive central section clad with an insulating cladding. The …
trench is filled with a conductive central section clad with an insulating cladding. The …
Process for fabricating capacitive elements in trenches
A Marzaki - US Patent 10,879,233, 2020 - Google Patents
This application claims the priority benefit of French According to one implementation, said
at least one sac Application for Patent No. 1757906, filed on Aug. 28, 2017, rificial trench …
at least one sac Application for Patent No. 1757906, filed on Aug. 28, 2017, rificial trench …
Semiconductor device and method for fabricating the same
S Lee - US Patent App. 13/338,556, 2012 - Google Patents
SUMMARY 0009 Exemplary embodiments of the present invention are directed to a
semiconductor device capable of preventing a punch-through from occurring between …
semiconductor device capable of preventing a punch-through from occurring between …
Three dimensional NAND flash with self-aligned select gate
JJ Sun, B Cleereman, M Lee - US Patent 10,229,928, 2019 - Google Patents
An integrated circuit may include a pillar of semiconductor material, a field effect transistor
having a channel that is formed in the pillar of semiconductor material, and two or more …
having a channel that is formed in the pillar of semiconductor material, and two or more …