The future of two-dimensional semiconductors beyond Moore's law

KS Kim, J Kwon, H Ryu, C Kim, H Kim, EK Lee… - Nature …, 2024 - nature.com
The primary challenge facing silicon-based electronics, crucial for modern technological
progress, is difficulty in dimensional scaling. This stems from a severe deterioration of …

Critical challenges in the development of electronics based on two-dimensional transition metal dichalcogenides

Y Wang, S Sarkar, H Yan, M Chhowalla - Nature Electronics, 2024 - nature.com
The development of high-performance electronic devices based on two-dimensional (2D)
transition metal dichalcogenide semiconductors has recently advanced from one-off proof-of …

Synthesis, modulation, and application of two-dimensional TMD heterostructures

R Wu, H Zhang, H Ma, B Zhao, W Li, Y Chen… - Chemical …, 2024 - ACS Publications
Two-dimensional (2D) transition metal dichalcogenide (TMD) heterostructures have
attracted a lot of attention due to their rich material diversity and stack geometry, precise …

Large-Area Epitaxial Growth of Transition Metal Dichalcogenides

G Xue, B Qin, C Ma, P Yin, C Liu, K Liu - Chemical Reviews, 2024 - ACS Publications
Over the past decade, research on atomically thin two-dimensional (2D) transition metal
dichalcogenides (TMDs) has expanded rapidly due to their unique properties such as high …

Integration of high-κ native oxides of gallium for two-dimensional transistors

K Yi, W Qin, Y Huang, Y Wu, S Feng, Q Fang, X Cao… - Nature …, 2024 - nature.com
The deposition of a metal oxide layer with good dielectric properties is a critical step in
fabricating the gate dielectric of transistors based on two-dimensional semiconductors …

Quantifying Structural Polarization by Continuous Regulation of Lone-Pair Electron Expression in Molecular Crystals

K Bu, X Feng, D Wang, T Fu, Y Ma, S Guo… - Journal of the …, 2024 - ACS Publications
Rational design of structural polarization is vital for modern technologies, as it allows the
physical properties of functional materials to be tailored. An effective approach for governing …

Ultraflat single-crystal hexagonal boron nitride for wafer-scale integration of a 2D-compatible high-κ metal gate

Y Wang, C Zhao, X Gao, L Zheng, J Qian, X Gao, J Li… - Nature Materials, 2024 - nature.com
Hexagonal boron nitride (hBN) has emerged as a promising protection layer for dielectric
integration in the next-generation large-scale integrated electronics. Although numerous …

Vertically grown metal nanosheets integrated with atomic-layer-deposited dielectrics for transistors with subnanometre capacitance-equivalent thicknesses

L Zhang, Z Liu, W Ai, J Chen, Z Lv, B Wang, M Yang… - Nature …, 2024 - nature.com
Integrating thin atomic-layer-deposited dielectrics with two-dimensional (2D)
semiconductors could be used to fabricate 2D transistors with sub-1 nm capacitance …

Interface states in gate stack of carbon nanotube array transistors

Y Liu, S Ding, W Li, Z Zhang, Z Pan, Y Ze, B Gao… - ACS …, 2024 - ACS Publications
A deep understanding of the interface states in metal–oxide–semiconductor (MOS)
structures is the premise of improving the gate stack quality, which sets the foundation for …

Solution-Processable and Printable Two-Dimensional Transition Metal Dichalcogenide Inks

Y Dai, Q He, Y Huang, X Duan, Z Lin - Chemical Reviews, 2024 - ACS Publications
Two-dimensional (2D) transition metal dichalcogenides (TMDs) with layered crystal
structures have been attracting enormous research interest for their atomic thickness …