Structural properties of self-organized semiconductor nanostructures
J Stangl, V Holý, G Bauer - Reviews of modern physics, 2004 - APS
Instabilities in semiconductor heterostructure growth can be exploited for the self-organized
formation of nanostructures, allowing for carrier confinement in all three spatial dimensions …
formation of nanostructures, allowing for carrier confinement in all three spatial dimensions …
Self-organization of nanostructures in semiconductor heteroepitaxy
C Teichert - Physics Reports, 2002 - Elsevier
In semiconductor heteroepitaxy the growing film frequently undergoes a series of strain relief
mechanisms that may include surface reconstruction, step bunching, faceting, and finally …
mechanisms that may include surface reconstruction, step bunching, faceting, and finally …
Microscopic view of epitaxial metal growth: nucleation and aggregation
H Brune - Surface Science Reports, 1998 - Elsevier
Thin films are often grown away from thermodynamic equilibrium and their morphology
becomes determined by kinetics. The final structure of the epitaxial film is decided in the very …
becomes determined by kinetics. The final structure of the epitaxial film is decided in the very …
[LIBRO][B] Heteroepitaxy of semiconductors: theory, growth, and characterization
In the past ten years, heteroepitaxy has continued to increase in importance with the
explosive growth of the electronics industry and the development of a myriad of …
explosive growth of the electronics industry and the development of a myriad of …
Growth and self-organization of SiGe nanostructures
Many recent advances in microelectronics would not have been possible without the
development of strain induced nanodevices and bandgap engineering, in particular …
development of strain induced nanodevices and bandgap engineering, in particular …
[LIBRO][B] Epitaxy of nanostructures
The general trend in modern solid state physics and technology is to make things smaller.
The size of key elements in modern devices approaches the nanometer scale, for both …
The size of key elements in modern devices approaches the nanometer scale, for both …
[LIBRO][B] Silicon Heterostructure Handbook: Materials, Fabrication, Devices, Circuits and Applications of SiGe and Si Strained-Layer Epitaxy
JD Cressler, S Monfray, G Freeman, D Friedman… - 2018 - taylorfrancis.com
An extraordinary combination of material science, manufacturing processes, and innovative
thinking spurred the development of SiGe heterojunction devices that offer a wide array of …
thinking spurred the development of SiGe heterojunction devices that offer a wide array of …
Ge/Si self-assembled quantum dots and their optoelectronic device applications
In recent years, quantum dots have been successfully grown by self-assembling processes.
For optoelectronic device applications, the quantum-dot structures have advantages such as …
For optoelectronic device applications, the quantum-dot structures have advantages such as …
Multiple layers of self-asssembled Ge/Si islands: Photoluminescence, strain fields, material interdiffusion, and island formation
Strain fields in stacked layers of vertically aligned self-assembled Ge islands on Si (100) can
cause a reduction of the wetting layer thickness in all but the initial layer and hence induce …
cause a reduction of the wetting layer thickness in all but the initial layer and hence induce …
Fibronectin adsorption, cell adhesion, and proliferation on nanostructured tantalum surfaces
The interaction between dental pulp derived mesenchymal stem cells (DP-MSCs) and three
different tantalum nanotopographies with and without a fibronectin coating is examined …
different tantalum nanotopographies with and without a fibronectin coating is examined …