High dielectric constant oxides
J Robertson - The European Physical Journal-Applied Physics, 2004 - cambridge.org
The scaling of complementary metal oxide semiconductor (CMOS) transistors has led to the
silicon dioxide layer used as a gate dielectric becoming so thin (1.4 nm) that its leakage …
silicon dioxide layer used as a gate dielectric becoming so thin (1.4 nm) that its leakage …
High dielectric constant gate oxides for metal oxide Si transistors
J Robertson - Reports on progress in Physics, 2005 - iopscience.iop.org
The scaling of complementary metal oxide semiconductor transistors has led to the silicon
dioxide layer, used as a gate dielectric, being so thin (1.4 nm) that its leakage current is too …
dioxide layer, used as a gate dielectric, being so thin (1.4 nm) that its leakage current is too …
QUANTUM ESPRESSO: a modular and open-source software project for quantum simulations of materials
QUANTUM ESPRESSO is an integrated suite of computer codes for electronic-structure
calculations and materials modeling, based on density-functional theory, plane waves, and …
calculations and materials modeling, based on density-functional theory, plane waves, and …
[HTML][HTML] The physics and chemistry of the Schottky barrier height
RT Tung - Applied Physics Reviews, 2014 - pubs.aip.org
The formation of the Schottky barrier height (SBH) is a complex problem because of the
dependence of the SBH on the atomic structure of the metal-semiconductor (MS) interface …
dependence of the SBH on the atomic structure of the metal-semiconductor (MS) interface …
Critical thickness for ferroelectricity in perovskite ultrathin films
The integration of ferroelectric oxide films into microelectronic devices,, combined with the
size reduction constraints imposed by the semiconductor industry, have revived interest in …
size reduction constraints imposed by the semiconductor industry, have revived interest in …
High-K materials and metal gates for CMOS applications
The scaling of complementary metal oxide semiconductor (CMOS) transistors has led to the
silicon dioxide layer used as a gate dielectric becoming so thin that the gate leakage current …
silicon dioxide layer used as a gate dielectric becoming so thin that the gate leakage current …
Electric polarization as a bulk quantity and its relation to surface charge
D Vanderbilt, RD King-Smith - Physical Review B, 1993 - APS
A definition of the electric polarization of an insulating crystalline solid is given in terms of the
centers of charge of the Wannier functions of the occupied bands. The change of this …
centers of charge of the Wannier functions of the occupied bands. The change of this …
Recent advances in Schottky barrier concepts
RT Tung - Materials Science and Engineering: R: Reports, 2001 - Elsevier
Theoretical models of Schottky-barrier height formation are reviewed. A particular emphasis
is placed on the examination of how these models agree with general physical principles …
is placed on the examination of how these models agree with general physical principles …
The impact of surface composition on the interfacial energetics and photoelectrochemical properties of BiVO4
The ability to engineer a photoelectrode surface is pivotal for optimizing the properties of any
photoelectrode used for solar fuel production. Altering crystal facets exposed on the surface …
photoelectrode used for solar fuel production. Altering crystal facets exposed on the surface …
Polarity of oxide surfaces and nanostructures
Whenever a compound crystal is cut normal to a randomly chosen direction, there is an
overwhelming probability that the resulting surface corresponds to a polar termination and is …
overwhelming probability that the resulting surface corresponds to a polar termination and is …