Recent advances in GaN‐based power HEMT devices

J He, WC Cheng, Q Wang, K Cheng… - Advanced electronic …, 2021 - Wiley Online Library
The ever‐increasing power density and operation frequency in electrical power conversion
systems require the development of power devices that can outperform conventional Si …

Reliability, applications and challenges of GaN HEMT technology for modern power devices: A review

N Islam, MFP Mohamed, MFAJ Khan, S Falina… - Crystals, 2022 - mdpi.com
A new generation of high-efficiency power devices is being developed using wide bandgap
(WBG) semiconductors, like GaN and SiC, which are emerging as attractive alternatives to …

GaN-based power devices: Physics, reliability, and perspectives

M Meneghini, C De Santi, I Abid, M Buffolo… - Journal of Applied …, 2021 - pubs.aip.org
Over the last decade, gallium nitride (GaN) has emerged as an excellent material for the
fabrication of power devices. Among the semiconductors for which power devices are …

Gallium nitride-based complementary logic integrated circuits

Z Zheng, L Zhang, W Song, S Feng, H Xu, J Sun… - Nature …, 2021 - nature.com
Owing to its energy efficiency, silicon complementary metal–oxide–semiconductor (CMOS)
technology is the current driving force of the integrated circuit industry. Silicon's narrow …

Prospects for wide bandgap and ultrawide bandgap CMOS devices

SJ Bader, H Lee, R Chaudhuri, S Huang… - … on Electron Devices, 2020 - ieeexplore.ieee.org
Power and RF electronics applications have spurred massive investment into a range of
wide and ultrawide bandgap semiconductor devices which can switch large currents and …

1200-V normally off GaN-on-Si field-effect transistors with low dynamic on-resistance

R Chu, A Corrion, M Chen, R Li, D Wong… - IEEE Electron …, 2011 - ieeexplore.ieee.org
This letter reports high-voltage GaN field-effect transistors fabricated on Si substrates. A
halide-based plasma treatment was performed to enable normally off operation. Atomic …

Control of threshold voltage of AlGaN/GaN HEMTs by fluoride-based plasma treatment: From depletion mode to enhancement mode

Y Cai, Y Zhou, KM Lau, KJ Chen - IEEE transactions on electron …, 2006 - ieeexplore.ieee.org
This paper presents a method with an accurate control of threshold voltages (V th) of
AlGaN/GaN high-electron mobility transistors (HEMTs) using a fluoride-based plasma …

Deep traps in GaN-based structures as affecting the performance of GaN devices

AY Polyakov, IH Lee - Materials Science and Engineering: R: Reports, 2015 - Elsevier
New developments in theoretical studies of defects and impurities in III-Nitrides as pertinent
to compensation and recombination in these materials are discussed. New results on …

600-V Normally Off /AlGaN/GaN MIS-HEMT With Large Gate Swing and Low Current Collapse

Z Tang, Q Jiang, Y Lu, S Huang, S Yang… - IEEE Electron …, 2013 - ieeexplore.ieee.org
In this letter, 600-V normally-OFF \rmSiN_x/AlGaN/GaN metal–insulator–semiconductor high-
electron-mobility transistor (MIS-HEMT) is reported. Normally-OFF operation and low OFF …

[КНИГА][B] Heteroepitaxy of semiconductors: theory, growth, and characterization

JE Ayers, T Kujofsa, P Rago, J Raphael - 2016 - taylorfrancis.com
In the past ten years, heteroepitaxy has continued to increase in importance with the
explosive growth of the electronics industry and the development of a myriad of …