[HTML][HTML] Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success
Atomic layer deposition (ALD) is a versatile technique for engineering the surfaces of porous
polymers, imbuing the flexible, high-surface-area substrates with inorganic and hybrid …
polymers, imbuing the flexible, high-surface-area substrates with inorganic and hybrid …
On the differences in trimethylaluminum infiltration into PMMA and PLA polymers for sequential infiltration synthesis: insights from experiment and first principles …
Sequential infiltration synthesis (SIS) is a powerful approach for templated growth of solid
materials such as oxides or metals that exploits the difference in interaction of a precursor …
materials such as oxides or metals that exploits the difference in interaction of a precursor …