Catalyst synthesis with precise control over the structure of catalytic active sites at the atomic
level is of essential importance for the scientific understanding of reaction mechanisms and …

Atomic layer deposition (ALD) is a gas-phase deposition technique that, by relying on self-
terminating surface chemistry, enables the control of the amount of deposited material down …

Films are deposited on a substrate by a process in which atomic layer deposition (ALD) is
used to deposit one layer of the film and pulsed chemical vapor deposition (CVD) is used to …

We studied the reduction of CuO (111) surface using density functional theory (DFT) with the
generalized gradient approximation corrected for on-site Coulomb interactions (GGA+ U) …

The coating of complex three-dimensional structures with ultrathin metal films is of great
interest for current technical applications, particularly in microelectronics, as well as for basic …

Recent trends in the microelectronics industry are requiring the growth of metallic first row
transition metal films by the atomic layer deposition (ALD) method. The ALD growth of noble …

Superhydrophobic TiO2 with great application potential is mainly obtained by surface
modification with low surface energy organics, which is easily degraded under sunlight …

Atomic layer deposition (ALD) relies on self-limiting reaction within a cyclic process and is
being considered as a potential technique for synthesizing nanomaterials with precisely …

Deposition of thin films with desired compositions, conformality and bonding to substrates is
a key component in nanotechnology research. The growth of metal films by atomic layer …

Conspectus The deposition of thin solid films is central to many industrial applications, and
chemical vapor deposition (CVD) methods are particularly useful for this task. For one, the …