Recent advances in metal sulfides: from controlled fabrication to electrocatalytic, photocatalytic and photoelectrochemical water splitting and beyond

S Chandrasekaran, L Yao, L Deng, C Bowen… - Chemical Society …, 2019 - pubs.rsc.org
In recent years, nanocrystals of metal sulfide materials have attracted scientific research
interest for renewable energy applications due to the abundant choice of materials with …

Fabrication of transistors on flexible substrates: from mass‐printing to high‐resolution alternative lithography strategies

PF Moonen, I Yakimets, J Huskens - Advanced materials, 2012 - Wiley Online Library
In this report, the development of conventional, mass‐printing strategies into high‐
resolution, alternative patterning techniques is reviewed with the focus on large‐area …

Semiconductor nanowire fabrication by bottom-up and top-down paradigms

RG Hobbs, N Petkov, JD Holmes - Chemistry of materials, 2012 - ACS Publications
Semiconductor nanowires have been the subject of intensive research investment over the
past few decades. Their physical properties afford them applications in a vast network of …

Deep-UV surface-enhanced resonance Raman scattering of adenine on aluminum nanoparticle arrays

SK Jha, Z Ahmed, M Agio, Y Ekinci… - Journal of the American …, 2012 - ACS Publications
We report the ultrasensitive detection of adenine using deep-UV surface-enhanced
resonance Raman scattering on aluminum nanostructures. Well-defined Al nanoparticle …

Highly scalable multichannel mesh electronics for stable chronic brain electrophysiology

TM Fu, G Hong, RD Viveros, T Zhou… - Proceedings of the …, 2017 - pnas.org
Implantable electrical probes have led to advances in neuroscience, brain− machine
interfaces, and treatment of neurological diseases, yet they remain limited in several key …

Scalable fabrication of metallic nanogaps at the sub‐10 nm level

S Luo, BH Hoff, SA Maier, JC de Mello - Advanced Science, 2021 - Wiley Online Library
Metallic nanogaps with metal–metal separations of less than 10 nm have many applications
in nanoscale photonics and electronics. However, their fabrication remains a considerable …

EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning

P Constantinou, TJZ Stock, LT Tseng, D Kazazis… - Nature …, 2024 - nature.com
Atomically precise hydrogen desorption lithography using scanning tunnelling microscopy
(STM) has enabled the development of single-atom, quantum-electronic devices on a …

High chromaticity aluminum plasmonic pixels for active liquid crystal displays

J Olson, A Manjavacas, T Basu, D Huang… - ACS …, 2016 - ACS Publications
Chromatic devices such as flat panel displays could, in principle, be substantially improved
by incorporating aluminum plasmonic nanostructures instead of conventional chromophores …

[HTML][HTML] Beyond EUV lithography: a comparative study of efficient photoresists' performance

N Mojarad, J Gobrecht, Y Ekinci - Scientific reports, 2015 - nature.com
Extreme ultraviolet (EUV) lithography at 13.5 nm is the main candidate for patterning
integrated circuits and reaching sub-10-nm resolution within the next decade. Should …

Nonchemically amplified molecular resists based on sulfonium-functionalized sulfone derivatives for sub-13 nm nanolithography

Y Wang, J Chen, Y Zeng, T Yu, S Wang… - ACS Applied Nano …, 2023 - ACS Publications
In this study, a series of molecular resists based on a bis (4-butoxyphenyl) sulfone core
attached to a varying number of radiation-sensitive triphenylsulfonium units (BPSS n, where …