Turnitin
降AI改写
早检测系统
早降重系统
Turnitin-UK版
万方检测-期刊版
维普编辑部版
Grammarly检测
Paperpass检测
checkpass检测
PaperYY检测
Recent advances in metal sulfides: from controlled fabrication to electrocatalytic, photocatalytic and photoelectrochemical water splitting and beyond
In recent years, nanocrystals of metal sulfide materials have attracted scientific research
interest for renewable energy applications due to the abundant choice of materials with …
interest for renewable energy applications due to the abundant choice of materials with …
Fabrication of transistors on flexible substrates: from mass‐printing to high‐resolution alternative lithography strategies
PF Moonen, I Yakimets, J Huskens - Advanced materials, 2012 - Wiley Online Library
In this report, the development of conventional, mass‐printing strategies into high‐
resolution, alternative patterning techniques is reviewed with the focus on large‐area …
resolution, alternative patterning techniques is reviewed with the focus on large‐area …
Semiconductor nanowire fabrication by bottom-up and top-down paradigms
Semiconductor nanowires have been the subject of intensive research investment over the
past few decades. Their physical properties afford them applications in a vast network of …
past few decades. Their physical properties afford them applications in a vast network of …
Deep-UV surface-enhanced resonance Raman scattering of adenine on aluminum nanoparticle arrays
We report the ultrasensitive detection of adenine using deep-UV surface-enhanced
resonance Raman scattering on aluminum nanostructures. Well-defined Al nanoparticle …
resonance Raman scattering on aluminum nanostructures. Well-defined Al nanoparticle …
Highly scalable multichannel mesh electronics for stable chronic brain electrophysiology
Implantable electrical probes have led to advances in neuroscience, brain− machine
interfaces, and treatment of neurological diseases, yet they remain limited in several key …
interfaces, and treatment of neurological diseases, yet they remain limited in several key …
Scalable fabrication of metallic nanogaps at the sub‐10 nm level
Metallic nanogaps with metal–metal separations of less than 10 nm have many applications
in nanoscale photonics and electronics. However, their fabrication remains a considerable …
in nanoscale photonics and electronics. However, their fabrication remains a considerable …
EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning
Atomically precise hydrogen desorption lithography using scanning tunnelling microscopy
(STM) has enabled the development of single-atom, quantum-electronic devices on a …
(STM) has enabled the development of single-atom, quantum-electronic devices on a …
High chromaticity aluminum plasmonic pixels for active liquid crystal displays
Chromatic devices such as flat panel displays could, in principle, be substantially improved
by incorporating aluminum plasmonic nanostructures instead of conventional chromophores …
by incorporating aluminum plasmonic nanostructures instead of conventional chromophores …
[HTML][HTML] Beyond EUV lithography: a comparative study of efficient photoresists' performance
N Mojarad, J Gobrecht, Y Ekinci - Scientific reports, 2015 - nature.com
Extreme ultraviolet (EUV) lithography at 13.5 nm is the main candidate for patterning
integrated circuits and reaching sub-10-nm resolution within the next decade. Should …
integrated circuits and reaching sub-10-nm resolution within the next decade. Should …
Nonchemically amplified molecular resists based on sulfonium-functionalized sulfone derivatives for sub-13 nm nanolithography
Y Wang, J Chen, Y Zeng, T Yu, S Wang… - ACS Applied Nano …, 2023 - ACS Publications
In this study, a series of molecular resists based on a bis (4-butoxyphenyl) sulfone core
attached to a varying number of radiation-sensitive triphenylsulfonium units (BPSS n, where …
attached to a varying number of radiation-sensitive triphenylsulfonium units (BPSS n, where …