In spite of its superior chemical sensitivity, XPS depth profiling is rarely used because of the
alteration introduced by the sputter removal process and the resulting inhomogeneous in …

The ionization region model (IRM) is applied to model a high power impulse magnetron
sputtering discharge with a tungsten target. The IRM gives the temporal variation of the …

In the research reported herein, CrN films were coated onto oxynitriding-treated AISI H13
alloy steel using direct current magnetron sputtering deposition technique. The AISI H13 …

The main focus of this work is to correlate the basic plasma properties with morphological,
structural and mechanical properties of thin films to bridge the gap between the energy …

The use of thin metallic layers at the thickness limit where transparency or spectral selectivity
are achieved is gaining increased interest. The use of cheap and abundant materials is …

Here, we compare the ionization region model (IRM) against experimental measurements of
particle densities and electron temperature in a high power impulse magnetron sputtering …

High-power pulse magnetron sputtering is a new type of magnetron sputtering technology
that has advantages such as high peak power density and a high ionization rate compared …

This research coated CrN films on oxynitriding-treated Vanadis 8 tool steel using the DC
magnetron sputtering process of the PVD technique. The experimental parameters include …

Crystalline phase and microstructure control are critical for obtaining desired properties of
Ta films deposited by magnetron sputtering. Structure, phase evolution and properties of Ta …

This study coated CrN films onto oxynitriding-treated Vanadis 23 high-speed steel using the
DC magnetron sputtering process of the PVD technique. The experimental parameters …