Gas-dynamic sources of cluster ions for basic and applied research
AE Ieshkin, AB Tolstoguzov, NG Korobeishchikov… - Uspekhi Fizicheskikh …, 2022 - ufn.ru
State of the art in the development and application of gas cluster ion sources is considered.
The mechanisms of neutral cluster formation, the techniques applied to study their flows and …
The mechanisms of neutral cluster formation, the techniques applied to study their flows and …
Surface topography and composition of NiPd alloys under oblique and normal gas cluster ion beam irradiation
AE Ieshkin, DS Kireev, AA Tatarintsev, VS Chernysh… - Surface Science, 2020 - Elsevier
Abstract Polycrystalline NiPd and Ni 5 Pd alloys were irradiated with argon gas cluster ion
beam and atomic ion beam. In situ XPS measurements showed surface enrichment with Ni …
beam and atomic ion beam. In situ XPS measurements showed surface enrichment with Ni …
Surface Smoothing by Gas Cluster Ion Beam Using Decreasing Three-Step Energy Treatment
V Pelenovich, X Zeng, X Zhang, D Fu, Y Lei, B Yang… - Coatings, 2023 - mdpi.com
A three-step treatment of Si wafers by gas cluster ion beam with decreasing energy was
used to improve the performance of surface smoothing. First, a high energy treatment at 15 …
used to improve the performance of surface smoothing. First, a high energy treatment at 15 …
Radiation-induced paramagnetic defects in porous silicon under He and Ar ion irradiation
AP Evseev, AV Kozhemiako, YV Kargina… - Radiation Physics and …, 2020 - Elsevier
A study of damage and the concentration of radiation-induced paramagnetic defects by He+
and Ar+ ion beam irradiation in porous silicon is presented. Porous silicon layers were …
and Ar+ ion beam irradiation in porous silicon is presented. Porous silicon layers were …
Features of defect formation in nanostructured silicon under ion irradiation
AV Kozhemiako, AP Evseev, YV Balakshin… - Semiconductors, 2019 - Springer
Nanostructured silicon is irradiated by Si+ and He+ ions with energies of 200 and 150 keV,
respectively. Destruction of the structure of irradiated samples and the accumulation of …
respectively. Destruction of the structure of irradiated samples and the accumulation of …
The combined effects of anodization parameters on morphological of the porous silicon and the ballistic electron emission of PS-based emitter
L He, Y Wang, X He, J Li, Q He, D Wei - Vacuum, 2020 - Elsevier
A new research strategy that fixed the anodic electrical charge was proposed to investigate
the combined effects of the anodization current density and anodization time on the porous …
the combined effects of the anodization current density and anodization time on the porous …
Influence of the charge state of xenon ions on the depth distribution profile upon implantation into silicon
YV Balakshin, AV Kozhemiako, S Petrovic, M Erich… - Semiconductors, 2019 - Springer
Experimental depth distributions of the concentration of implanted xenon ions depending on
their charge state and irradiation energy are presented. Xenon ions in charge states q= 1 …
their charge state and irradiation energy are presented. Xenon ions in charge states q= 1 …
Experimental observation of the confinement of atomic collision cascades during ion sputtering of porous silicon
AE Ieshkin, AB Tolstoguzov, SE Svyakhovskiy… - Technical Physics …, 2019 - Springer
Results of investigation of the mass spectra of secondary ions sputtered from bulk
(continuous) and porous silicon targets with various characteristic core particle dimensions …
(continuous) and porous silicon targets with various characteristic core particle dimensions …
The Effect of Surface Nanostructures Duty Ratio on Their Evolution under Oblique Cluster Ion Beam
DS Kireev, AE Ieshkin, VS Chernysh - Moscow University Physics Bulletin, 2019 - Springer
This paper proposes the use of surfaces with a preformed ordered nanotopography to study
the mechanisms of the evolution of surface topography under ion beam irradiation. The …
the mechanisms of the evolution of surface topography under ion beam irradiation. The …
Особенности дефектообразования в наноструктурированном кремнии при ионном облучении
АВ Кожемяко, АП Евсеев, ЮВ Балакшин… - Физика и техника …, 2019 - mathnet.ru
Проведено облучение наноструктурированного кремния ионами Si $^{+} $ и He $^{+} $
с энергиями 200 и 150 кэВ соответственно. Методом комбинационного рассеяния …
с энергиями 200 и 150 кэВ соответственно. Методом комбинационного рассеяния …