Turnitin
降AI改写
早检测系统
早降重系统
Turnitin-UK版
万方检测-期刊版
维普编辑部版
Grammarly检测
Paperpass检测
checkpass检测
PaperYY检测
EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning
Atomically precise hydrogen desorption lithography using scanning tunnelling microscopy
(STM) has enabled the development of single-atom, quantum-electronic devices on a …
(STM) has enabled the development of single-atom, quantum-electronic devices on a …
Resistless EUV lithography: Photon-induced oxide patterning on silicon
In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated
silicon (100) surface in the absence of a photoresist. EUV lithography is the leading …
silicon (100) surface in the absence of a photoresist. EUV lithography is the leading …
Direct Observation of 2DEG States in Shallow Si: Sb δ-Layers
We investigate the electronic structure of high-density layers of Sb dopants in a silicon host,
so-called Si: Sb δ-layers. We show that, in spite of the known challenges in producing highly …
so-called Si: Sb δ-layers. We show that, in spite of the known challenges in producing highly …
Probing the Atomic Arrangement of Subsurface Dopants in a Silicon Quantum Device Platform
High-density structures of subsurface phosphorus dopants in silicon continue to garner
interest as a silicon-based quantum computer platform; however, a much-needed …
interest as a silicon-based quantum computer platform; however, a much-needed …
Discrete, Shallow Do** of Semiconductors via Cylinder‐Forming Block Copolymer Self‐Assembly
Block copolymer (BCP) self‐assembly‐assisted do** for semiconductors is used to
achieve discrete do** with nanometer‐scale junction depth, high throughput, and large …
achieve discrete do** with nanometer‐scale junction depth, high throughput, and large …
Direct measurement of 2DEG states in shallow Si:Sb -layers
FS Strand, SP Cooil, QT Campbell… - ar**-applications/10.1117/12.2514830.short" data-clk="hl=nl&sa=T&ct=res&cd=9&d=1749398823439565218&ei=Emy9Z5z1BPqu6rQPqLq_sQU" data-clk-atid="ogGaEfYcRxgJ" target="_blank">Ultra-thin conformal coating for spin-on do** applications
As devices become ever smaller and more sophisticated, there is also a general need for
creating high quality defect-free thin coatings of polymers on 3-dimensional wafer …
creating high quality defect-free thin coatings of polymers on 3-dimensional wafer …