GaN integration technology, an ideal candidate for high-temperature applications: A review

A Hassan, Y Savaria, M Sawan - IEEE Access, 2018 - ieeexplore.ieee.org
In many leading industrial applications such as aerospace, military, automotive, and deep-
well drilling, extreme temperature environment is the fundamental hindrance to the use of …

GaN-based power high-electron-mobility transistors on Si substrates: From materials to devices

N Wu, Z ** small polaron tunneling electrical conduction in oxygen-deficient β-Ga2O3 thin film on p-Si (100)
S Karmakar, IF Shiam, R Droopad, A Haque - Applied Physics A, 2024 - Springer
Monoclinic β-Ga2O3 thin films were grown on heavily doped p-type Si substrate by pulsed
laser deposition (PLD) at growth temperature 700° C and oxygen partial pressure 1× 10–2 …

Thermal and Electrical Stability Assessment of AlGaN/GaN Metal–Oxide–Semiconductor High-Electron Mobility Transistors (MOS-HEMTs) With HfO2 Gate Dielectric

Z Gao, MF Romero, F Calle - IEEE Transactions on Electron …, 2018 - ieeexplore.ieee.org
AlGaN/GaN high-electron mobility transistors (HEMTs) and metal-oxide-semiconductor
(MOS)-HEMTs using HfO 2 as a gate dielectric have been analyzed at room temperature …

A study of electrical characteristics of Gd2O3/GaN and Gd2O3/AlGaN/GaN MOS Heterostructures

J Ghosh, S Das, S Mukherjee, S Ganguly… - Microelectronic …, 2019 - Elsevier
In this paper, we present the electrical properties of hexagonal Gd 2 O 3 grown epitaxially on
GaN/Si (111) and AlGaN/GaN/Si (111) virtual substrates. GaN and AlGaN/GaN …

AlGaN/GaN Metal-Oxide-Semiconductor High-Electron Mobility Transistors Using Ga2O3 Gate Dielectric Layer Grown by Vapor Cooling Condensation System

HY Lee, TW Chang, CT Lee - Journal of Electronic Materials, 2021 - Springer
In this study, intrinsic Ga 2 O 3 (i-Ga 2 O 3) film was deposited at about 80 K using a vapor
cooling condensation system. Its bandgap energy was 5.0 eV. Low oxygen vacancy and …