Polymers for electronics and spintronics

P Bujak, I Kulszewicz-Bajer, M Zagorska… - Chemical Society …, 2013 - pubs.rsc.org
This critical review is devoted to semiconducting and high spin polymers which are of great
scientific interest in view of further development of the organic electronics and the emerging …

[HTML][HTML] Enabling nanotechnology with self assembled block copolymer patterns

C Park, J Yoon, EL Thomas - Polymer, 2003 - Elsevier
Block copolymers (BCPs) have received great attention for the past 40 years but only within
the past decade have they been seriously considered for nanotechnological applications …

Directing the self-assembly of block copolymers

SB Darling - Progress in polymer science, 2007 - Elsevier
Recently, a new spotlight has been focused on block copolymers, thoroughly studied for
nearly half a century, because of their potential use in numerous nanotechnologies. This …

Block copolymer thin films: Physics and applications

MJ Fasolka, AM Mayes - Annual Review of Materials Research, 2001 - annualreviews.org
▪ Abstract A two-part review of research concerning block copolymer thin films is presented.
The first section summarizes experimental and theoretical studies of the fundamental …

Ordering in thin films of block copolymers: Fundamentals to potential applications

IW Hamley - Progress in polymer science, 2009 - Elsevier
The ordering of block copolymers in thin films is reviewed, starting from the fundamental
principles and extending to recent promising developments as templates for …

Nanostructure fabrication using block copolymers

IW Hamley - Nanotechnology, 2003 - iopscience.iop.org
A brief overview is provided of recent developments in the use of block copolymer self-
assembly to create morphologies that may be used to template the fabrication of …

Orientation-controlled self-assembled nanolithography using a polystyrene− polydimethylsiloxane block copolymer

YS Jung, CA Ross - Nano letters, 2007 - ACS Publications
Templated self-assembly of a cylinder-forming poly (styrene-b-dimethylsiloxane)(PS−
PDMS) diblock copolymer has been investigated for nanolithography applications. The large …

Polymer self assembly in semiconductor microelectronics

CT Black, R Ruiz, G Breyta, JY Cheng… - IBM Journal of …, 2007 - ieeexplore.ieee.org
We are inspired by the beauty and simplicity of self-organizing materials and the promise
they hold for enabling continued improvements in semiconductor technology. Self assembly …

Mechanisms of ordering in striped patterns

C Harrison, DH Adamson, Z Cheng, JM Sebastian… - Science, 2000 - science.org
We have studied the ordering dynamics of the striped patterns of a single layer of cylindrical
block copolymer microdomains in a thin film. By tracking disclinations during annealing with …

Controlled surface‐initiated polymerizations in aqueous media

DM Jones, WTS Huck - Advanced Materials, 2001 - Wiley Online Library
The rapid, controlled formation of thick brushes (up to 125 nm thick) from self‐assembled
monolayer‐bound initiators under mild conditions using aqueous solutions is demonstrated …